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Wen Chen
Wen Chen
Pritzker School of Molecular Engineering, the University of Chicago
在 uchicago.edu 的电子邮件经过验证 - 首页
标题
引用次数
引用次数
年份
Optimized design of block copolymers with covarying properties for nanolithography
H Feng, M Dolejsi, N Zhu, S Yim, W Loo, P Ma, C Zhou, GSW Craig, ...
Nature Materials 21 (12), 1426-1433, 2022
292022
Material design strategies for recovery of critical resources from water
OA Kazi, W Chen, JG Eatman, F Gao, Y Liu, Y Wang, Z Xia, SB Darling
Advanced Materials 35 (36), 2300913, 2023
162023
Tunable ion transport with freestanding vermiculite membranes
Z Xia, W Chen, R Shevate, Y Wang, F Gao, D Wang, OA Kazi, AU Mane, ...
ACS nano 16 (11), 18266-18273, 2022
142022
Synthesis and Characterization of Block Copolymers for Nanolithography Based on Thiol‐Ene “Click” Functionalized Polystyrene‐Block‐Polybutadiene
H Feng, M Dolejsi, N Zhu, PJ Griffin, GSW Craig, W Chen, SJ Rowan, ...
Advanced Functional Materials 32 (46), 2206836, 2022
52022
Wetting Behavior of A-block-(B-random-C) Copolymers with Equal Block Surface Energies on Surfaces Functionalized with B-random-C Copolymers
H Feng, B Kash, S Yim, K Bagchi, GSW Craig, W Chen, SJ Rowan, ...
Langmuir 39 (41), 14688-14698, 2023
12023
Using discotic liquid crystals to prepare biaxially textured organic semiconductors
K Bagchi, T Emersic, Z Wang, W Chen, J De Pablo, P Nealey
APS March Meeting Abstracts 2023, Q33. 009, 2023
12023
Pushing the limits of size selectivity in nanoscale solute separations
F Gao, W Chen, JG Eatman, RZ Waldman, NJ Zaluzec, R Dong, ...
Nature Water 2 (6), 521-530, 2024
2024
Self-brushing for nanopatterning: achieving perpendicular domain orientation in block copolymer thin films
H Feng, W Chen, GSW Craig, SJ Rowan, PF Nealey
Nanoscale 16 (17), 8618-8626, 2024
2024
Crystalline solid retains memory of anisotropy in precursor liquid crystalline phase
K Bagchi, T Emeršič, Z Wang, W Chen, M Kim, C Eom, Z Jiang, J Strzalka, ...
Journal of Materials Chemistry C 11 (34), 11466-11475, 2023
2023
High throughput platform to meet covarying materials manufacturing design criteria at multiple length scales for block copolymer nanolithography
H Feng, W Loo, W Chen, M Dolejsi, N Zhu, J De Pablo, S Rowan, ...
American Chemical Society, 2022
2022
The effect of structural isomerism on block copolymer self-assembly
H Feng, W Loo, W Chen, C Eom, L Schneider, S Rowan, P Nealey
APS March Meeting Abstracts 2022, K16. 010, 2022
2022
Isoporous membranes as a platform to understand nanoscale transport behavior in aqueous environments
W Chen
APS March Meeting Abstracts 2022, T71. 007, 2022
2022
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