| The p-type conduction mechanism in Cu 2 O: a first principles study M Nolan, SD Elliott Physical Chemistry Chemical Physics 8 (45), 5350-5358, 2006 | 404 | 2006 |
| Ab initio study of surfaces HP Pinto, RM Nieminen, SD Elliott Physical Review B—Condensed Matter and Materials Physics 70 (12), 125402, 2004 | 274 | 2004 |
| Clusters of aluminium, a density functional study R Ahlrichs, SD Elliott Physical Chemistry Chemical Physics 1 (1), 13-21, 1999 | 232 | 1999 |
| Ozone-based atomic layer deposition of alumina from TMA: Growth, morphology, and reaction mechanism SD Elliott, G Scarel, C Wiemer, M Fanciulli, G Pavia Chemistry of materials 18 (16), 3764-3773, 2006 | 229 | 2006 |
| Chiral shells and achiral cores in CdS quantum dots SD Elliott, MP Moloney, YK Gun’ko Nano Letters 8 (8), 2452-2457, 2008 | 223 | 2008 |
| TURBOMOLE, version 5.6 R Ahlrichs, M Bär, HP Baron, R Bauernschmitt, S Böcker, M Ehrig, ... Theoretical Chemistry Group, University of Karlsruhe, 2002 | 218 | 2002 |
| Reduction mechanisms of the CuO (111) surface through surface oxygen vacancy formation and hydrogen adsorption Y Maimaiti, M Nolan, SD Elliott Physical Chemistry Chemical Physics 16 (7), 3036-3046, 2014 | 190 | 2014 |
| Electronic structure of point defects in controlled self-doping of the (110) surface: Combined photoemission spectroscopy and density functional theory study M Nolan, SD Elliott, JS Mulley, RA Bennett, M Basham, P Mulheran Physical Review B—Condensed Matter and Materials Physics 77 (23), 235424, 2008 | 183 | 2008 |
| Simulating the atomic layer deposition of alumina from first principles SD Elliott, JC Greer Journal of Materials Chemistry 14 (21), 3246-3250, 2004 | 179 | 2004 |
| Turbomole (vers. 5.6) R Ahlrichs, M Bär, HP Baron, R Bauernschmitt, S Böcker, P Deglmann, ... Universität Karlsruhe, 2002 | 150* | 2002 |
| Atomic-scale simulation of ALD chemistry SD Elliott Semiconductor Science and Technology 27 (7), 074008, 2012 | 147 | 2012 |
| Orientation of individual molecules adsorbed on Cu(111): Low-temperature scanning tunneling microscopy and density functional calculations JA Larsson, SD Elliott, JC Greer, J Repp, G Meyer, R Allenspach Physical Review B—Condensed Matter and Materials Physics 77 (11), 115434, 2008 | 110 | 2008 |
| Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook RA Ovanesyan, EA Filatova, SD Elliott, DM Hausmann, DC Smith, ... Journal of Vacuum Science & Technology A 37 (6), 2019 | 105 | 2019 |
| Studying chemical vapor deposition processes with theoretical chemistry H Pedersen, SD Elliott Theoretical Chemistry Accounts 133, 1-10, 2014 | 105 | 2014 |
| Tuning the Transparency of Cu2O with Substitutional Cation Doping M Nolan, SD Elliott Chemistry of Materials 20 (17), 5522-5531, 2008 | 96 | 2008 |
| Atomistic kinetic Monte Carlo study of atomic layer deposition derived from density functional theory M Shirazi, SD Elliott Journal of computational chemistry 35 (3), 244-259, 2014 | 92 | 2014 |
| Effect of reaction mechanism on precursor exposure time in atomic layer deposition of silicon oxide and silicon nitride CA Murray, SD Elliott, D Hausmann, J Henri, A LaVoie ACS applied materials & interfaces 6 (13), 10534-10541, 2014 | 88 | 2014 |
| New rigid backbone conjugated organic polymers with large fluorescence quantum yields AP Davey, S Elliott, O O'Connor, W Blau Journal of the Chemical Society, Chemical Communications, 1433-1434, 1995 | 87 | 1995 |
| Modeling Mechanism and Growth Reactions for New Nanofabrication Processes by Atomic Layer Deposition. SD Elliott, G Dey, Y Maimaiti, H Ablat, EA Filatova, GN Fomengia Advanced Materials (Deerfield Beach, Fla.) 28 (27), 5367-5380, 2015 | 82 | 2015 |
| Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? K Ishikawa, K Karahashi, T Ishijima, SI Cho, S Elliott, D Hausmann, ... Japanese Journal of Applied Physics 57 (6S2), 06JA01, 2018 | 80 | 2018 |
Michael NolanTyndall National Institute, University College Cork, Ireland在 tyndall.ie 的电子邮件经过验证
