Influence of molecular weight and film thickness on the glass transition temperature and coefficient of thermal expansion of supported ultrathin polymer films L Singh, PJ Ludovice, CL Henderson Thin solid films 449 (1-2), 231-241, 2004 | 161 | 2004 |
The mechanism of phenolic polymer dissolution: A new perspective PC Tsiartas, LW Flanagin, CL Henderson, WD Hinsberg, IC Sanchez, ... Macromolecules 30 (16), 4656-4664, 1997 | 160 | 1997 |
Area selective atomic layer deposition of titanium dioxide: Effect of precursor chemistry A Sinha, DW Hess, CL Henderson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2006 | 157 | 2006 |
Fabrication of microchannels using polycarbonates as sacrificial materials HA Reed, CE White, V Rao, SAB Allen, CL Henderson, PA Kohl Journal of Micromechanics and Microengineering 11 (6), 733, 2001 | 133 | 2001 |
Air-channel fabrication for microelectromechanical systems via sacrificial photosensitive polycarbonates JP Jayachandran, HA Reed, H Zhen, LF Rhodes, CL Henderson, ... Journal of Microelectromechanical Systems 12 (2), 147-159, 2003 | 125 | 2003 |
Engineering substructure morphology of asymmetric carbon molecular sieve hollow fiber membranes N Bhuwania, Y Labreche, CSK Achoundong, J Baltazar, SK Burgess, ... Carbon 76, 417-434, 2014 | 113 | 2014 |
Modeling effects of oxygen inhibition in mask‐based stereolithography AS Jariwala, F Ding, A Boddapati, V Breedveld, MA Grover, ... Rapid Prototyping Journal 17 (3), 168-175, 2011 | 105 | 2011 |
Area-selective ALD of titanium dioxide using lithographically defined poly (methyl methacrylate) films A Sinha, DW Hess, CL Henderson Journal of the Electrochemical Society 153 (5), G465, 2006 | 103 | 2006 |
High charge carrier mobility, low band gap donor–acceptor benzothiadiazole-oligothiophene based polymeric semiconductors B Fu, J Baltazar, Z Hu, AT Chien, S Kumar, CL Henderson, DM Collard, ... Chemistry of Materials 24 (21), 4123-4133, 2012 | 101 | 2012 |
A correlation study between barrier film performance and shelf lifetime of encapsulated organic solar cells N Kim, WJ Potscavage Jr, A Sundaramoothi, C Henderson, B Kippelen, ... Solar energy materials and Solar cells 101, 140-146, 2012 | 95 | 2012 |
Production of heavily n-and p-doped CVD graphene with solution-processed redox-active metal–organic species SA Paniagua, J Baltazar, H Sojoudi, SK Mohapatra, S Zhang, ... Materials Horizons 1 (1), 111-115, 2014 | 90 | 2014 |
Fabrication of semiconductor device with air gaps for ultra low capacitance interconnections and methods of making same PA Kohl, SAB Allen, CL Henderson, HA Reed, DM Bhusari US Patent 6,610,593, 2003 | 88 | 2003 |
Sacrificial compositions and methods of fabricating a structure using sacrificial compositions PA Kohl, PJ Joseph, HK Reed, SA Bidstrup-Allen, CE White, ... US Patent 7,695,894, 2010 | 84 | 2010 |
Transport behavior of atomic layer deposition precursors through polymer masking layers: Influence on area selective atomic layer deposition A Sinha, DW Hess, CL Henderson Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2007 | 80 | 2007 |
Patterning of sacrificial materials W King, C Henderson, H Rowland, C White US Patent App. 10/990,940, 2005 | 80 | 2005 |
Creating graphene p–n junctions using self-assembled monolayers H Sojoudi, J Baltazar, LM Tolbert, CL Henderson, S Graham ACS applied materials & interfaces 4 (9), 4781-4786, 2012 | 74 | 2012 |
Impact of post-growth thermal annealing and environmental exposure on the unintentional doping of CVD graphene films H Sojoudi, J Baltazar, C Henderson, S Graham Journal of Vacuum Science & Technology B 30 (4), 2012 | 71 | 2012 |
A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films A Sinha, DW Hess, CL Henderson Electrochemical and solid-state letters 9 (11), G330, 2006 | 61 | 2006 |
Gel time prediction of multifunctional acrylates using a kinetics model A Boddapati, SB Rahane, RP Slopek, V Breedveld, CL Henderson, ... Polymer 52 (3), 866-873, 2011 | 56 | 2011 |
Nanopatterning materials using area selective atomic layer deposition in conjunction with thermochemical surface modification via heated AFM cantilever probe lithography Y Hua, WP King, CL Henderson Microelectronic engineering 85 (5-6), 934-936, 2008 | 53 | 2008 |