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Mitsuaki Kaneko
Mitsuaki Kaneko
在 semicon.kuee.kyoto-u.ac.jp 的电子邮件经过验证
标题
引用次数
引用次数
年份
Mobility improvement of 4H-SiC (0001) MOSFETs by a three-step process of H2 etching, SiO2 deposition, and interface nitridation
K Tachiki, M Kaneko, T Kimoto
Applied Physics Express 14 (3), 031001, 2021
652021
High-temperature operation of n-and p-channel JFETs fabricated by ion implantation into a high-purity semi-insulating SiC substrate
M Kaneko, T Kimoto
IEEE Electron Device Letters 39 (5), 723-726, 2018
442018
Formation of high-quality SiC (0001)/SiO2 structures by excluding oxidation process with H2 etching before SiO2 deposition and high-temperature N2 annealing
K Tachiki, M Kaneko, T Kobayashi, T Kimoto
Applied Physics Express 13 (12), 121002, 2020
402020
Normally-off 400° C operation of n-and p-JFETs with a side-gate structure fabricated by ion implantation into a high-purity semi-insulating SiC substrate
M Nakajima, M Kaneko, T Kimoto
IEEE Electron Device Letters 40 (6), 866-869, 2019
342019
Experimental determination of impact ionization coefficients along< 1120> in 4H-SiC
D Stefanakis, X Chi, T Maeda, M Kaneko, T Kimoto
IEEE Transactions on Electron Devices 67 (9), 3740-3744, 2020
232020
Electron mobility along< 0001> and< 11̅00> directions in 4H-SiC over a wide range of donor concentration and temperature
R Ishikawa, M Hara, H Tanaka, M Kaneko, T Kimoto
Applied Physics Express 14 (6), 061005, 2021
202021
Mobility enhancement in heavily doped 4H-SiC (0001),(112̄0), and (11̄00) MOSFETs via an oxidation-minimizing process
K Tachiki, K Mikami, K Ito, M Kaneko, T Kimoto
Applied Physics Express 15 (7), 071001, 2022
192022
SiC complementary junction field-effect transistor logic gate operation at 623 K
M Kaneko, M Nakajima, Q Jin, T Kimoto
IEEE Electron Device Letters 43 (7), 997-1000, 2022
192022
Optical properties of highly strained AlN coherently grown on 6H-SiC (0001)
M Kaneko, H Okumura, R Ishii, M Funato, Y Kawakami, T Kimoto, J Suda
Applied physics express 6 (6), 062604, 2013
172013
Tunneling current in 4H-SiC pn junction diodes
M Kaneko, X Chi, T Kimoto
IEEE Transactions on Electron Devices 67 (8), 3329-3334, 2020
142020
Nearly Fermi-level-pinning-free interface in metal/heavily-doped SiC Schottky structures
M Hara, M Kaneko, T Kimoto
Japanese Journal of Applied Physics 60 (SB), SBBD14, 2021
112021
SiC vertical-channel n-and p-JFETs fully fabricated by ion implantation
M Kaneko, U Grossner, T Kimoto
Materials Science Forum 963, 841-844, 2019
112019
Critical electric field for transition of thermionic field emission/field emission transport in heavily doped SiC Schottky barrier diodes
M Hara, H Tanaka, M Kaneko, T Kimoto
Applied Physics Letters 120 (17), 2022
102022
Experimental study on short-channel effects in double-gate silicon carbide JFETs
M Kaneko, M Nakajima, Q Jin, T Kimoto
IEEE Transactions on Electron Devices 67 (10), 4538-4540, 2020
92020
Strong impact of the initial III/V ratio on the crystalline quality of an AlN layer grown by rf-plasma-assisted molecular-beam epitaxy
M Kaneko, T Kimoto, J Suda
Applied Physics Express 9 (2), 025502, 2016
92016
Deep-ultraviolet light emission from 4H-AlN/4H-GaN short-period superlattice grown on 4H-SiC (112¯)
M Kaneko, S Ueta, M Horita, T Kimoto, J Suda
Applied Physics Letters 112 (1), 2018
82018
Lateral spreads of ion-implanted Al and P atoms in silicon carbide
Q Jin, M Nakajima, M Kaneko, T Kimoto
Japanese Journal of Applied Physics 60 (5), 051001, 2021
72021
Tunneling current through non-alloyed metal/heavily-doped SiC interfaces
M Hara, T Kitawaki, H Tanaka, M Kaneko, T Kimoto
Materials Science in Semiconductor Processing 171, 108023, 2024
62024
Experimental and Theoretical Study on Anisotropic Electron Mobility in 4H‐SiC
R Ishikawa, H Tanaka, M Kaneko, T Kimoto
physica status solidi (b) 260 (10), 2300275, 2023
62023
Enhanced tunneling current and low contact resistivity at Mg contacts on heavily phosphorus-ion-implanted SiC
M Hara, M Kaneko, T Kimoto
Applied Physics Express 16 (2), 021003, 2023
62023
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