| Review of inductively coupled plasmas for plasma processing J Hopwood Plasma Sources Science and Technology 1 (2), 109, 1992 | 913 | 1992 |
| Metal ion deposition from ionized mangetron sputtering discharge SM Rossnagel, J Hopwood Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 504 | 1994 |
| Langmuir probe measurements of a radio frequency induction plasma J Hopwood, CR Guarnieri, SJ Whitehair, JJ Cuomo Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (1 …, 1993 | 402 | 1993 |
| Magnetron sputter deposition with high levels of metal ionization SM Rossnagel, J Hopwood Applied physics letters 63 (24), 3285-3287, 1993 | 386 | 1993 |
| Electromagnetic fields in a radio‐frequency induction plasma J Hopwood, CR Guarnieri, SJ Whitehair, JJ Cuomo Journal Of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 11 (1 …, 1993 | 242 | 1993 |
| Mechanisms for highly ionized magnetron sputtering J Hopwood, F Qian Journal of Applied Physics 78 (2), 758-765, 1995 | 206 | 1995 |
| Radio frequency induction plasma processing system utilizing a uniform field coil JJ Cuomo, CR Guarnieri, JA Hopwood, SJ Whitehair US Patent 5,280,154, 1994 | 199 | 1994 |
| Low-power microwave plasma source based on a microstrip split-ring resonator F Iza, JA Hopwood IEEE transactions on plasma science 31 (4), 782-787, 2003 | 198 | 2003 |
| Ionized physical vapor deposition of integrated circuit interconnects J Hopwood Physics of Plasmas 5 (5), 1624-1631, 1998 | 181 | 1998 |
| Split-ring resonator microplasma: microwave model, plasma impedance and power efficiency F Iza, J Hopwood Plasma Sources Science and Technology 14 (2), 397, 2005 | 176 | 2005 |
| Miniaturization of inductively coupled plasma sources Y Yin, J Messier, JA Hopwood IEEE Transactions on plasma science 27 (5), 1516-1524, 1999 | 162 | 1999 |
| Ion bombardment energy distributions in a radio frequency induction plasma J Hopwood Applied physics letters 62 (9), 940-942, 1993 | 158 | 1993 |
| A microfabricated inductively coupled plasma generator JA Hopwood Journal of Microelectromechanical Systems 9 (3), 309-313, 2000 | 143 | 2000 |
| Ionized physical vapor deposition J Hopwood, A Wendt, S Rossnagel, W Holber, KF Lai, J Forster, ... Academic Press 27, 253, 1999 | 140* | 1999 |
| Rotational, vibrational, and excitation temperatures of a microwave-frequency microplasma F Iza, JA Hopwood IEEE transactions on plasma science 32 (2), 498-504, 2004 | 129 | 2004 |
| Planar RF induction plasma coupling efficiency J Hopwood Plasma Sources Science and Technology 3 (4), 460, 1994 | 112 | 1994 |
| Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source J Hopwood, DK Reinhard, J Asmussen Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 8 (4 …, 1990 | 112 | 1990 |
| A microfabricated atmospheric-pressure microplasma source operating in air J Hopwood, F Iza, S Coy, DB Fenner Journal of Physics D: Applied Physics 38 (11), 1698, 2005 | 107 | 2005 |
| Optically pumped microplasma rare gas laser WT Rawlins, KL Galbally-Kinney, SJ Davis, AR Hoskinson, JA Hopwood, ... Optics express 23 (4), 4804-4813, 2015 | 98 | 2015 |
| Microplasmas ignited and sustained by microwaves J Hopwood, AR Hoskinson, J Gregório Plasma Sources Science and Technology 23 (6), 064002, 2014 | 89 | 2014 |
Felipe IzaLoughborough University在 lboro.ac.uk 的电子邮件经过验证
