受强制性开放获取政策约束的文章 - Si Joon Kim了解详情
可在其他位置公开访问的文章：4 篇
Multifunctional, Room-Temperature Processable, Heterogeneous Organic Passivation Layer for Oxide Semiconductor Thin-Film Transistors
YJ Tak, ST Keene, BH Kang, WG Kim, SJ Kim, A Salleo, HJ Kim
ACS Applied Materials & Interfaces 12 (2), 2615-2624, 2019
强制性开放获取政策： US National Science Foundation
Ferroelectric polarization retention with scaling of Hf0. 5Zr0. 5O2 on silicon
J Mohan, H Hernandez-Arriaga, YC Jung, T Onaya, CY Nam, EHR Tsai, ...
Applied Physics Letters 118 (10), 2021
强制性开放获取政策： US Department of Energy
Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant
YC Jung, JH Kim, H Hernandez-Arriaga, J Mohan, SM Hwang, DN Le, ...
Applied Physics Letters 121 (22), 222901, 2022
强制性开放获取政策： US Department of Energy
Toward Low-Thermal-Budget Hafnia-Based Ferroelectrics via Atomic Layer Deposition
JH Kim, T Onaya, HR Park, YC Jung, DN Le, M Lee, H Hernandez-Arriaga, ...
ACS Applied Electronic Materials 5 (9), 4726-4745, 2023
强制性开放获取政策： US Department of Energy
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