| Principles of lithography HJ Levinson SPIE press, 2005 | 1001 | 2005 |
| Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems AR Pawloski, AY Abdo, GR Amblard, BM LaFontaine, I Lalovic, ... US Patent 7,014,966, 2006 | 512 | 2006 |
| Laser spectral engineering for lithographic process A Kroyan, I Lalovic, IV Fomenkov, PP Das, RL Sandstrom, JM Algots, ... US Patent 6,671,294, 2003 | 114 | 2003 |
| Characterization of line-edge roughness in photoresist using an image fading technique AR Pawloski, A Acheta, I Lalovic, BM La Fontaine, HJ Levinson Advances in Resist Technology and Processing XXI 5376, 414-425, 2004 | 86 | 2004 |
| Laser system AI Ershov, WN Partlo, DJW Brown, IV Fomenkov, RA Bergstedt, ... US Patent 7,885,309, 2011 | 71 | 2011 |
| Laser spectral engineering for lithographic process RL Spangler, JP Lipcon, JA Rule, RN Jacques, A Kroyan, I Lalovic, ... US Patent 6,853,653, 2005 | 63 | 2005 |
| Laser system AI Ershov, WN Partlo, DJW Brown, IV Fomenkov, RA Bergstedt, I Lalovic US Patent 7,999,915, 2011 | 30 | 2011 |
| Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy I Lalovic, BM LaFontaine US Patent 7,087,907, 2006 | 30 | 2006 |
| Effects of 95% integral vs. FWHM bandwidth specifications on lithographic imaging A Kroyan, I Lalovic, NR Farrar Optical Microlithography XIV 4346, 1244-1253, 2001 | 27 | 2001 |
| Impact of finite laser bandwidth on the critical dimension of L/S structures P De Bisschop, I Lalovic, F Trintchouk Journal of Micro/Nanolithography, MEMS and MOEMS 7 (3), 033001-033001-16, 2008 | 25 | 2008 |
| Extreme ultraviolet (EUV) lithography masks HJ Levinson, BM LaFontaine, I Lalovic, AR Pawloski US Patent 6,984,475, 2006 | 22 | 2006 |
| Wafer-based light source parameter control I Lalovic, O Zurita, GA Rechtsteiner, P Alagna, S Hsieh, JJ Lee, R Rokitski, ... US Patent 9,715,180, 2017 | 21 | 2017 |
| Understanding chromatic aberration impacts on lithographic imaging K Lai, I Lalovic, B Fair, A Kroyan, CJ Progler, N Farrar, D Ames, K Ahmed Journal of Micro/Nanolithography, MEMS and MOEMS 2 (2), 105-111, 2003 | 20 | 2003 |
| Laser bandwidth effect on overlay budget and imaging for the 45 nm and 32nm technology nodes with immersion lithography U Iessi, M Kupers, E De Chiara, P Rigolli, I Lalovic, G Capetti Optical Microlithography XXIII 7640, 845-856, 2010 | 19 | 2010 |
| Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system I Lalovic, BM LaFontaine US Patent 7,081,956, 2006 | 19 | 2006 |
| Lithography contrast enhancement technique by varying focus with wavelength modulation J Kye, I Lalovic, CF Lyons, R Subramanian US Patent 6,829,040, 2004 | 19 | 2004 |
| Influence of laser spatial parameters and illuminator pupil-fill performance on the lithographic performance of a scanner SP Renwick, SD Slonaker, I Lalovic, K Ahmed Optical Microlithography XV 4691, 1400-1411, 2002 | 19 | 2002 |
| Behavior of lens aberrations as a function of wavelength on KrF and ArF lithography scanners M Terry, I Lalovic, GM Wells, AH Smith Optical Microlithography XIV 4346, 15-24, 2001 | 18 | 2001 |
| Laser spectral engineering for lithographic process RL Spangler, JP Lipcon, JA Rule, RN Jacques, A Kroyan, I Lalovic, ... US Patent 7,382,815, 2008 | 17 | 2008 |
| Modeling and performance metrics for longitudinal chromatic aberrations, focus-drilling, and Z-noise: exploring excimer laser pulse-spectra M Smith, J Bendik, I Lalovic, N Farrar, W Howard, C Sallee Optical Microlithography XX 6520, 1218-1225, 2007 | 17 | 2007 |
Cyrus TaberyElectronics Design Automation, Intel在 intel.com 的电子邮件经过验证
Cyrus TaberyElectronics Design Automation, Intel在 intel.com 的电子邮件经过验证
Paolo ZambonApple, Inc.在 apple.com 的电子邮件经过验证
Stefan HunscheASML / Brion Technologies在 asml.com 的电子邮件经过验证