Andre Anders 个人学术档案 - 学术资源搜索

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引用	24240	7407
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Efim OksTomsk state university of control systems and radioelectronics (TUSUR)在 fet.tusur.ru 的电子邮件经过验证
Joakim AnderssonResearcher, Division of Solid State Electronics, Uppsala University在 angstrom.uu.se 的电子邮件经过验证
Prabir K. RoyLawrence Livermore National Laboratory在 llnl.gov 的电子邮件经过验证
Rueben J. MendelsbergFreeform Future在 freeformfuture.com 的电子邮件经过验证
Kin Man YuDepartment of Physics, City University of Hong Kong在 cityu.edu.hk 的电子邮件经过验证
Professor Jose Luis EndrinoUniversidad Loyola在 uloyola.es 的电子邮件经过验证
Jochen M. SchneiderProfessor, Materials Chemistry, RWTH Aachen University在 mch.rwth-aachen.de 的电子邮件经过验证
Charanjit Singh BhatiaNational University of Singapore在 nus.edu.sg 的电子邮件经过验证
Robert FranzMontanuniversität Leoben, Austria在 unileoben.ac.at 的电子邮件经过验证
Adam B. SefkowAssistant Professor, University of Rochester在 rochester.edu 的电子邮件经过验证
Joel W. Ager IIISenior Staff Scientist, Lawrence Berkeley Nat. Laboratory and Adjunct Professor, MSE, UC Berkeley在 lbl.gov 的电子邮件经过验证
david horwatFull Professor, Institut Jean Lamour, Université de Lorraine在 univ-lorraine.fr 的电子邮件经过验证
Jon Tomas GudmundssonUniversity of Iceland在 hi.is 的电子邮件经过验证
Kyriakos KOMVOPOULOSDistinguished Professor of Mechanical Engineering, University of California, Berkeley在 me.berkeley.edu 的电子邮件经过验证
Matthaeus LeitnerLawrence Berkeley National Laboratory在 lbl.gov 的电子邮件经过验证
Daniel LundinGuest professor, Linköping University在 liu.se 的电子邮件经过验证
Othon MonteiroBaker Hughes在 materialsnanotech.com 的电子邮件经过验证
Jochen ScheinProfessor, Universität der Bundeswehr在 unibw.de 的电子邮件经过验证
Johanna RosenLinköping University在 liu.se 的电子邮件经过验证
Ting TsuiUniversity of Waterloo在 uwaterloo.ca 的电子邮件经过验证

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Andre Anders

Leibniz Institute of Surface Engineering (IOM)

在 iom-leipzig.de 的电子邮件经过验证 - 首页

Plasma Physics Thin Films Material Science


标题按引用次数排序按年份排序按标题排序	引用次数引用次数	年份
A structure zone diagram including plasma-based deposition and ion etching A Anders Thin solid films 518 (15), 4087-4090, 2010	1061	2010
Cathodic Arcs: From Fractal Spots to Energetic Condensation A Anders Cathodic Arcs: From Fractal Spots to Energetic Condensation. New York …, 2008	1032	2008
Handbook of plasma immersion ion implantation and deposition A Anders Wiley, 2000	753	2000
Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals G Garcia, R Buonsanti, EL Runnerstrom, RJ Mendelsberg, A Llordes, ... Nano letters 11 (10), 4415-4420, 2011	637	2011
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks TY Tsui, GM Pharr, WC Oliver, CS Bhatia, RL White, S Anders, A Anders, ... MRS Online Proceedings Library (OPL) 383, 447, 1995	492	1995
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field A Anders, GY Yushkov Journal of Applied Physics 91 (8), 4824-4832, 2002	471	2002
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering A Anders, J Andersson, A Ehiasarian Journal of applied physics 102 (11), 2007	437	2007
Ion charge state distributions of vacuum arc plasmas: The origin of species A Anders Physical Review E 55 (1), 969, 1997	433	1997
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS) A Anders Journal of Applied Physics 121 (17), 2017	370	2017
Metal plasma immersion ion implantation and deposition: a review A Anders Surface and Coatings Technology 93 (2-3), 158-167, 1997	357	1997
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing GM Pharr, DL Callahan, SD McAdams, TY Tsui, S Anders, A Anders, ... Applied physics letters 68 (6), 779-781, 1996	340	1996
Approaches to rid cathodic arc plasmas of macro-and nanoparticles: a review A Anders Surface and Coatings Technology 120, 319-330, 1999	339	1999
Discharge physics of high power impulse magnetron sputtering A Anders Surface and Coatings Technology 205, S1-S9, 2011	337	2011
A discussion on the absence of plasma in spark plasma sintering DM Hulbert, A Anders, J Andersson, EJ Lavernia, AK Mukherjee Scripta Materialia 60 (10), 835-838, 2009	324	2009
Ion velocities in vacuum arc plasmas GY Yushkov, A Anders, EM Oks, IG Brown Journal of Applied Physics 88 (10), 5618-5622, 2000	313	2000
Review of cathodic arc deposition technology at the start of the new millennium DM Sanders, A Anders Surface and Coatings Technology 133, 78-90, 2000	313	2000
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) A Anders Surface and Coatings Technology 257, 308-325, 2014	287	2014
The absence of plasma in “spark plasma sintering” DM Hulbert, A Anders, DV Dudina, J Andersson, D Jiang, C Unuvar, ... Journal of Applied Physics 104 (3), 2008	276	2008
Plasma-based ion implantation and deposition: A review of physics, technology, and applications J Pelletier, A Anders IEEE Transactions on Plasma Science 33 (6), 1944-1959, 2005	255	2005
Deposition rates of high power impulse magnetron sputtering: Physics and economics A Anders Journal of Vacuum Science & Technology A 28 (4), 783-790, 2010	243	2010

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