| New development of atomic layer deposition: processes, methods and applications PO Oviroh, R Akbarzadeh, D Pan, RAM Coetzee, TC Jen Science and technology of advanced materials 20 (1), 465-496, 2019 | 433 | 2019 |
| Optimal slope angle selection of an evacuated tube collector for domestic solar water heating RAM Coetzee, A Mwesigye, Z Huan Journal of Energy in Southern Africa 28 (1), 104-119, 2017 | 16 | 2017 |
| The mechanistic effect over the substrate in a square type atomic layer deposition reactor RAM Coetzee, TC Jen, M Bhamjee, J Lu International Journal of Modern Physics B 33 (01n03), 1940018, 2019 | 13 | 2019 |
| Operating pressure influences over micro trenches in exposure time introduced atomic layer deposition TC Oladipo, Olufunsho Coetzee, Rigardt Alfred Maarten Olubambi, Peter Apata Jen International Journal of Heat and Mass Transfer 153, 2020 | 12 | 2020 |
| The fluid flow effect on the inlet injection of the thin film deposition in a square type atomic layer deposition reactor RAM Coetzee, HL Lu, TC Jen Procedia Manufacturing 35, 223-228, 2019 | 9 | 2019 |
| Investigating the purge flow rate in a reactor scale simulation of an atomic layer deposition process EC Nwanna, RAM Coetzee, TC Jen ASME International Mechanical Engineering Congress and Exposition 59384 …, 2019 | 7 | 2019 |
| The mechanistic process analysis and temperature effect in a low pressure square type atomic layer deposition reactor RAM Coetzee, TC Jen, M Bhamjee, J Lu International Journal of Mechanical Engineering and Robotics Research 8 (5), 2019 | 7 | 2019 |
| The mechanistic process comparison between a novel slotted injection manifold versus the multiple injection manifold of a low pressure square type atomic layer deposition reactor RAM Coetzee, TC Jen ASME International Mechanical Engineering Congress and Exposition 52019 …, 2018 | 5 | 2018 |
| A numerical approach on the selection of the purge flow rate in an atomic layer deposition (ALD) process EC Nwanna, RAM Coetzee, TC Jen Physics of Fluids 34 (5), 2022 | 4 | 2022 |
| Numerical modeling of atomic layer deposition supercycles TJ Kunene, RAM Coetzee, L Tartibu, TC Jen Materials Today: Proceedings 62, S30-S39, 2022 | 4 | 2022 |
| The investigation of the exposure time effects with pressure in the atomic layer deposition process over micro-trench surface OO Olotu, RAM Coetzee, PA Olubambia, TC Jen International Journal of Mechanical Engineering and Robotics Research 9 (3 …, 2020 | 3 | 2020 |
| A numerical analysis and optimization of the dynamic performance of a multipurpose solar thermal system for residential applications RAM Coetzee, A Mwesigye, Z Huan Science and Technology for the Built Environment 24 (10), 1156-1173, 2018 | 3 | 2018 |
| A numerical model for optimal receiver array and mass flow rate in residential solar water heating systems RAM Coetzee, A Mwesigye, Z Huan International Journal of Sustainable Energy 37 (9), 902-918, 2018 | 3 | 2018 |
| The Nano-Mechanical Engineering Future RAM Coetzee The South African Mechanical Engineer 70, 2019 | 2* | 2019 |
| The Flow Evolution of the Atomic Layer Deposition Process: A Numerical Study of the Implimentation of a Porous Plate DJ Hoenselaar, RAM Coetzee, M Bhamjee, TC Jen 2020 3rd International Conference on Power and Energy Applications (ICPEA …, 2020 | 1 | 2020 |
| A first principle study on the adhesion and stability of Al2O3 (0001)/PT (111) film interface LM Mohlala, RAM Coetzee, TC Jen, PA Olubambi ASME 2019 International Mechanical Engineering Congress and Exposition …, 2019 | 1 | 2019 |
| The design and optimisation of a multi-purpose solar thermal system for residential use. RAM Coetzee | 1 | 2017 |
| A numerical analysis for the dynamic performance of a multi-purpose solar thermal system for residential applications RAM Coetzee, A Mwesigye, Z Huan HEFAT, 2017 | 1 | 2017 |
| The Topology Within Recirculating Flow in the Atomic Layer Deposition Thin Film Process RAM Coetzee, DJ Hoenselaar, M Bhamjee, TC Jen ASME International Mechanical Engineering Congress and Exposition 84485 …, 2020 | | 2020 |
| The Numerical Investigation on the Fundamental Physical Flow and Chemical Phenomena Within the Atomic Layer Deposition Process RAM Coetzee PQDT-Global, 2020 | | 2020 |
Tien-Chien JenUniversity of Johannesburg, ASME Fellow, ASSAf Fellow, SARChI Chair在 uj.ac.za 的电子邮件经过验证
