关注
Stephen Rossnagel
Stephen Rossnagel
UVA Dept Mat. Sci.
在 virginia.edu 的电子邮件经过验证
标题
引用次数
引用次数
年份
Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions
SM Rossnagel, JJ Cuomo, WD Westwood
(No Title), 1990
1142*1990
Alteration of Cu conductivity in the size effect regime
SM Rossnagel, TS Kuan
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
5532004
Metal ion deposition from ionized mangetron sputtering discharge
SM Rossnagel, J Hopwood
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
5041994
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES
AJ Kellock, H Kim, DG Park, SV Nitta, S Purushothaman, S Rossnagel, ...
US Patent App. 12/203,338, 2010
4482010
Magnetron sputter deposition with high levels of metal ionization
SM Rossnagel, J Hopwood
Applied physics letters 63 (24), 3285-3287, 1993
3861993
Gas density reduction effects in magnetrons
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (1 …, 1988
3491988
Ionic field effect transistors with sub-10 nm multiple nanopores
SW Nam, MJ Rooks, KB Kim, SM Rossnagel
Nano letters 9 (5), 2044-2048, 2009
3202009
Thin film deposition with physical vapor deposition and related technologies
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (5 …, 2003
3132003
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
SM Rossnagel, A Sherman, F Turner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
3012000
Structure for confining the switching current in phase memory (PCM) cells
GW Burr, CH Lam, S Raoux, SM Rossnagel, AG Schrott, JZ Sun, ...
US Patent 7,488,967, 2009
2872009
Directional and ionized physical vapor deposition for microelectronics applications
SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
2211998
Collimated magnetron sputter deposition
SM Rossnagel, D Mikalsen, H Kinoshita, JJ Cuomo
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (2 …, 1991
2051991
Phase transformation of thin sputter-deposited tungsten films at room temperature
SM Rossnagel, IC Noyan, C Cabral Jr
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1932002
PVD for microelectronics: sputter deposition applied to semiconductor manufacturing
RA Powell, SM Rossnagel
(No Title), 1999
1851999
Systems and methods for controlling position of charged polymer inside nanopore
S Polonsky, SM Rossnagel, GA Stolovitzky
US Patent 8,003,319, 2011
1812011
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
H Kim, C Cabral Jr, C Lavoie, SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1682002
Film modification by low energy ion bombardment during deposition
SM Rossnagel, JJ Cuomo
Thin Solid Films 171 (1), 143-156, 1989
1611989
Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
H Kim, C Detavenier, O Van der Straten, SM Rossnagel, AJ Kellock, ...
Journal of applied physics 98 (1), 2005
1582005
Sputter deposition for semiconductor manufacturing
SM Rossnagel
IBM Journal of Research and development 43 (1.2), 163-179, 1999
1571999
Current–voltage relations in magnetrons
SM Rossnagel, HR Kaufman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (2 …, 1988
1561988
系统目前无法执行此操作,请稍后再试。
文章 1–20