| Transformer vae: A hierarchical model for structure-aware and interpretable music representation learning J Jiang, GG Xia, DB Carlton, CN Anderson, RH Miyakawa ICASSP 2020-2020 IEEE International Conference on Acoustics, Speech and …, 2020 | 104 | 2020 |
| Critical challenges for EUV resist materials PP Naulleau, CN Anderson, LM Baclea-An, P Denham, S George, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 17-26, 2011 | 91 | 2011 |
| The SEMATECH Berkeley MET pushing EUV development beyond 22nm half pitch P Naulleau, CN Anderson, LM Baclea-an, D Chan, P Denham, S George, ... Extreme Ultraviolet (EUV) Lithography 7636, 530-538, 2010 | 37 | 2010 |
| The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6. x-nm C Anderson, D Ashworth, LM Baclea-An, S Bhattari, R Chao, R Claus, ... Extreme Ultraviolet (EUV) Lithography III 8322, 330-336, 2012 | 29 | 2012 |
| The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond PP Naulleau, CN Anderson, LM Baclea-an, P Denham, S George, ... Alternative Lithographic Technologies 7271, 247-257, 2009 | 17 | 2009 |
| Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection YG Wang, R Miyakawa, W Chao, M Benk, A Wojdyla, A Donoghue, ... Extreme Ultraviolet (EUV) Lithography VI 9422, 420-429, 2015 | 14 | 2015 |
| Lateral shearing interferometry for high-resolution EUV optical testing R Miyakawa, P Naulleau Extreme Ultraviolet (EUV) Lithography II 7969, 991-996, 2011 | 14 | 2011 |
| Analysis of systematic errors in lateral shearing interferometry for EUV optical testing R Miyakawa, P Naulleau, K Goldberg Metrology, Inspection, and Process Control for Microlithography XXIII 7272 …, 2009 | 13 | 2009 |
| Direct index of refraction measurements at extreme-ultraviolet and soft-x-ray wavelengths K Rosfjord, C Chang, R Miyakawa, H Barth, D Attwood Applied optics 45 (8), 1730-1736, 2006 | 13 | 2006 |
| Zernike phase contrast microscope for EUV mask inspection YG Wang, R Miyakawa, A Neureuther, P Naulleau Extreme Ultraviolet (EUV) Lithography V 9048, 266-273, 2014 | 12 | 2014 |
| Molybdenum/silicon multilayer components for high harmonic generation sources EM Gullikson, CN Anderson, SS Kim, D Lee, R Miyakawa, F Salmassi, ... Applied Optics 54 (13), 4280-4284, 2015 | 11 | 2015 |
| Electro-optical system for scanning microscopy of extreme ultraviolet masks with a high harmonic generation source PP Naulleau, CN Anderson, EH Anderson, N Andreson, W Chao, C Choi, ... Optics Express 22 (17), 20144-20154, 2014 | 11 | 2014 |
| Wavefront metrology for high resolution optical systems RH Miyakawa University of California, Berkeley, 2011 | 11 | 2011 |
| Phase-enhanced defect sensitivity for EUV mask inspection YG Wang, R Miyakawa, W Chao, K Goldberg, A Neureuther, P Naulleau Photomask Technology 2014 9235, 126-133, 2014 | 10 | 2014 |
| Extending shearing interferometry to high-NA for EUV optical testing R Miyakawa, P Naulleau Extreme Ultraviolet (EUV) Lithography VI 9422, 496-501, 2015 | 9 | 2015 |
| Quantitative phase retrieval for EUV photomasks S Sherwin, I Cordova, R Miyakawa, L Waller, A Neureuther, P Naulleau Extreme Ultraviolet (EUV) Lithography XI 11323, 281-290, 2020 | 8 | 2020 |
| Emulation of anamorphic imaging on the SHARP extreme ultraviolet mask microscope MP Benk, A Wojdyla, W Chao, F Salmassi, S Oh, YG Wang, RH Miyakawa, ... Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (3), 033501-033501, 2016 | 8 | 2016 |
| Overview and status of the 0.5 NA EUV microfield exposure tool at Berkeley Lab C Anderson, A Allezy, W Chao, C Cork, W Cork, R Delano, J DePonte, ... Extreme Ultraviolet (EUV) Lithography X 10957, 1095708, 2019 | 7 | 2019 |
| Upgrade to the SHARP EUV mask microscope M Benk, W Chao, R Miyakawa, K Goldberg, P Naulleau Extreme Ultraviolet (EUV) Lithography X 10957, 204-210, 2019 | 7 | 2019 |
| Experimental verification of EUV mask limitations at high numerical apertures R Chao, P Graeupner, E Gullikson, SS Kim, JT Neumann, R Miyakawa, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 463-470, 2013 | 7 | 2013 |
