| Substrate treating apparatus and substrate treating method Y Sasaki, Y Hanawa, S Nadahara, D Ueda, H Kitagawa, K Okumura US Patent 10,153,181, 2018 | 18 | 2018 |
| Substrate cleaning method and substrate cleaning apparatus Y Sasaki, Y Hanawa, K Miya US Patent 10,286,425, 2019 | 9 | 2019 |
| Substrate treating method and substrate treating apparatus Y Hanawa, Y Sasaki US Patent 10,699,920, 2020 | 6 | 2020 |
| Multi-scale analysis for solidification of phase change materials (PCMs): experiments and modeling M Xu, Y Hanawa, S Akhtar, A Sakuma, J Zhang, J Yoshida, M Sanada, ... International Journal of Heat and Mass Transfer 212, 124182, 2023 | 5 | 2023 |
| Breakthrough of sublimation drying by liquid phase deposition Y Sasaki, Y Hanawa, M Otsuji, N Fujiwara, M Kato, Y Yamaguchi, ... Solid State Phenomena 314, 172-177, 2021 | 5 | 2021 |
| Substrate treating method and substrate treating apparatus Y Hanawa, D Ueda, Y Sasaki US Patent 11,133,175, 2021 | 4 | 2021 |
| Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces D Ueda, Y Hanawa, H Kitagawa, N Fujiwara, M Otsuji, H Takahashi, ... Solid State Phenomena 314, 155-160, 2021 | 4 | 2021 |
| Thermomechanical formulation of freezing point depression behavior of liquid on solid surface with nanostructure Y Hanawa, Y Sasaki, S Uchida, T Funayoshi, M Otsuji, H Takahashi, ... ASME International Mechanical Engineering Congress and Exposition 84591 …, 2020 | 4 | 2020 |
| Substrate treating method and substrate treating apparatus Y Hanawa, Y Sasaki US Patent App. 16/037,016, 2019 | 4 | 2019 |
| Vapor supplying apparatus, vapor drying apparatus, vapor supplying method, and vapor drying method Y Hanawa, K Miya US Patent 9,976,804, 2018 | 4 | 2018 |
| Substrate cleaning method and substrate cleaning apparatus Y Hanawa, K Miya, Y Sasaki US Patent 9,728,396, 2017 | 3 | 2017 |
| Substrate treating method and apparatus used therefor Y Sasaki, Y Hanawa, S Kunieda US Patent App. 17/893,750, 2023 | 1 | 2023 |
| Substrate drying method and substrate drying apparatus Y Hanawa, Y Sasaki US Patent 11,158,523, 2021 | 1 | 2021 |
| Model potential of dimer system and coherence length of electron injected by scanning tunneling microscope on Ge (0 0 1) surface H Kawai, Y Yoshimoto, O Narikiyo, Y Hanawa, A Imamura Surface science 602 (18), 3010-3017, 2008 | 1 | 2008 |
| SUBSTRATE TREATING METHOD, SUBSTRATE TREATING APPARATUS, AND TREATMENT LIQUID S Kunieda, Y Sasaki, Y Hanawa US Patent App. 18/693,304, 2024 | | 2024 |
| SUBSTRATE TREATING METHOD, SUBSTRATE TREATING APPARATUS, TREATMENT LIQUID, AND TREATMENT LIQUID EVALUATION METHOD S Kunieda, Y Sasaki, K Uonami, Y Hanawa US Patent App. 18/437,852, 2024 | | 2024 |
| Substrate treating method and treatment liquid Y Sasaki, Y Hanawa, S Kunieda US Patent App. 18/557,913, 2024 | | 2024 |
| New Formulas for Evaluation of Cyclohexanol Solidification on Substrates with Surface Nanostructures Y Hanawa, J Zhang, AP Sasmito, M Xu, S Akhtar, M Mohit, J Yoshida, ... ACS omega, 2024 | | 2024 |
| Substrate treating method and substrate treating apparatus Y Hanawa, D Ueda, A Harumoto US Patent App. 18/550,617, 2024 | | 2024 |
| Substrate treating method, substrate treating apparatus and substrate treating liquid S Kunieda, Y Sasaki, Y Hanawa US Patent App. 18/452,977, 2024 | | 2024 |
Agus P. SasmitoDepartment of Mining and Materials Engineering, McGill University, Montreal, QC, Canada在 mcgill.ca 的电子邮件经过验证
