Deep learning acceleration in 14nm CMOS compatible ReRAM array: device, material and algorithm co-optimization N Gong, MJ Rasch, SC Seo, A Gasasira, P Solomon, V Bragaglia, ... 2022 International Electron Devices Meeting (IEDM), 33.7. 1-33.7. 4, 2022 | 15 | 2022 |
Resistive memory process optimization for high resistance switching toward scalable analog compute technology for deep learning Y Kim, SC Seo, S Consiglio, P Jamison, H Higuchi, M Rasch, EY Wu, ... IEEE Electron Device Letters 42 (5), 759-762, 2021 | 7 | 2021 |
Method for selective etching at an interface between materials S Voronin, C Catano, N Joy, A Ranjan, C Talone US Patent 11,133,194, 2021 | 6 | 2021 |
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Holistic litho-etch development to address patterning challenges towards high NA EUV S Nagahara, A Dauendorffer, X Liu, T Onitsuka, H Genjima, N Nagamine, ... International Conference on Extreme Ultraviolet Lithography 2022, PC122920N, 2022 | 3 | 2022 |
Methods to protect nitride layers during formation of silicon germanium nano-wires in microelectronic workpieces Y Yoshida, C Catano, C Talone, N Joy, S Voronin US Patent 10,903,077, 2021 | 2 | 2021 |
Plasma etching techniques P Luan, C Catano, A Mosden US Patent 11,424,120, 2022 | 1 | 2022 |
Implementation of an Actively Compensated RF-driven Probe Technique for Diagnostics of VHF RF Plasmas C Smith, C Catano, J Shearer, S Voronin, A Ko Bulletin of the American Physical Society, 2024 | | 2024 |
Method for gate stack formation and etching S Voronin, C Catano, SC Han, S Sridhar, Y Yoshida, C Talone, A Ranjan US Patent 12,009,430, 2024 | | 2024 |
Demonstration of transfer learning using 14 nm technology analog ReRAM array FF Athena, O Fagbohungbe, N Gong, MJ Rasch, J Penaloza, SC Seo, ... Frontiers in Electronics 4, 1331280, 2024 | | 2024 |
Plasma etching techniques P Luan, C Catano, A Mosden US Patent 11,837,467, 2023 | | 2023 |
Challenges in the patterning of RRAM devices for analog computing applications (Conference Presentation) I Saraf, S Sridhar, C Catano, S Voronin, D Kong, SC Seo, Y Kim, T Ando, ... Advanced Etch Technology for Nanopatterning IX 11329, 113290N, 2020 | | 2020 |