Recent and expected roles of plasma‐polymerized films for biomedical applications R Förch, AN Chifen, A Bousquet, HL Khor, M Jungblut, LQ Chu, Z Zhang, ... Chemical Vapor Deposition 13 (6‐7), 280-294, 2007 | 188 | 2007 |
Growth and modification of organosilicon films in PECVD and remote afterglow reactors P Supiot, C Vivien, A Granier, A Bousquet, A Mackova, D Escaich, ... Plasma processes and polymers 3 (2), 100-109, 2006 | 73 | 2006 |
Optical simulation and preparation of novel Mo/ZrSiN/ZrSiON/SiO2 solar selective absorbing coating Y Ning, W Wang, L Wang, Y Sun, P Song, H Man, Y Zhang, B Dai, ... Solar Energy Materials and Solar Cells 167, 178-183, 2017 | 71 | 2017 |
The investigation of thermal stability of Al/NbMoN/NbMoON/SiO2 solar selective absorbing coating P Song, Y Wu, L Wang, Y Sun, Y Ning, Y Zhang, B Dai, E Tomasella, ... Solar Energy Materials and Solar Cells 171, 253-257, 2017 | 63 | 2017 |
Optical simulation and experimental optimization of Al/NbMoN/NbMoON/SiO2 solar selective absorbing coatings Y Wu, C Wang, Y Sun, Y Xue, Y Ning, W Wang, S Zhao, E Tomasella, ... Solar energy materials and solar cells 134, 373-380, 2015 | 50 | 2015 |
Total hemispherical emissivity of sintered SiC up to 1850 K in high vacuum and in air at different pressures M Balat-Pichelin, A Bousquet Journal of the European Ceramic Society 38 (10), 3447-3456, 2018 | 39 | 2018 |
Multiphase Structure of Tantalum Oxynitride TaOxNy Thin Films Deposited by Reactive Magnetron Sputtering C Taviot-Gueho, J Cellier, A Bousquet, E Tomasella The Journal of Physical Chemistry C 119 (41), 23559-23571, 2015 | 37 | 2015 |
Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas A Bousquet, V Bursikova, A Goullet, A Djouadi, L Zajickova, A Granier Surface and Coatings Technology 200 (22-23), 6517-6521, 2006 | 36 | 2006 |
Study on the thermal stability of Al/NbTiSiN/NbTiSiON/SiO2 solar selective absorbing coating Y Wu, C Wang, Y Sun, Y Ning, Y Liu, Y Xue, W Wang, S Zhao, ... Solar Energy 119, 18-28, 2015 | 35 | 2015 |
Investigation of O-atom kinetics in O2, CO2, H2O and O2/HMDSO low pressure radiofrequency pulsed plasmas by time-resolved optical emission spectroscopy A Bousquet, G Cartry, A Granier Plasma Sources Science and Technology 16 (3), 597, 2007 | 34 | 2007 |
Influence of plasma pulsing on the deposition kinetics and film structure in low pressure oxygen/hexamethyldisiloxane radiofrequency plasmas A Bousquet, A Granier, A Goullet, JP Landesman Thin Solid Films 514 (1-2), 45-51, 2006 | 34 | 2006 |
Structural and optical investigations of silicon carbon nitride thin films deposited by magnetron sputtering E Tomasella, L Spinelle, A Bousquet, F Rebib, M Dubois, C Eypert, ... Plasma Processes and Polymers 6 (S1), S11-S16, 2009 | 32 | 2009 |
Effects of substrates, film thickness and temperature on thermal emittance of Mo/substrate deposited by magnetron sputtering Y Ning, W Wang, Y Sun, Y Wu, Y Liu, H Man, MI Malik, C Wang, S Zhao, ... Vacuum 128, 73-79, 2016 | 30 | 2016 |
Tailoring the structural and optical properties of bismuth oxide films deposited by reactive magnetron sputtering for photocatalytic application S Ibrahim, P Bonnet, M Sarakha, C Caperaa, G Monier, A Bousquet Materials Chemistry and Physics 243, 122580, 2020 | 24 | 2020 |
Composition and optical properties tunability of hydrogenated silicon carbonitride thin films deposited by reactive magnetron sputtering A Bachar, A Bousquet, H Mehdi, G Monier, C Robert-Goumet, L Thomas, ... Applied Surface Science 444, 293-302, 2018 | 24 | 2018 |
Control the Composition of Tantalum Oxynitride Films by Sputtering a Tantalum Target in Ar/O2/N2 Radiofrequency Magnetron Plasmas A Bousquet, F Zoubian, J Cellier, T Sauvage, E Tomasella Plasma Processes and Polymers 10 (11), 990-998, 2013 | 24 | 2013 |
Mechanisms Involved in the Conversion of ppHMDSO Films into SiO2‐Like by Oxygen Plasma Treatment A Granier, G Borvon, A Bousquet, A Goullet, C Leteinturier, A van Der Lee Plasma Processes and Polymers 3 (4‐5), 365-373, 2006 | 23 | 2006 |
In-situ optical emission spectroscopy for a better control of hybrid sputtering/evaporation process for the deposition of Cu (In, Ga) Se2 layers J Posada, M Jubault, A Bousquet, E Tomasella, D Lincot Thin Solid Films 582, 279-283, 2015 | 21 | 2015 |
Optical Emission Spectroscopy Analysis of Ar/N2 Plasma in Reactive Magnetron Sputtering A Bousquet, L Spinelle, J Cellier, E Tomasella Plasma Processes and Polymers 6 (S1), S605-S609, 2009 | 19 | 2009 |
Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges L Zajíčková, V Buršíková, D Franta, A Bousquet, A Granier, A Goullet, ... Plasma Processes and Polymers 4 (S1), S287-S293, 2007 | 19 | 2007 |