Ramanathan Srinivasan 个人学术档案

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引用	3488	1967
h 指数	28	19
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Tanmay BasakProfessor, Chemical Engineering, Indian Insttitute of Technology Madras在 iitm.ac.in 的电子邮件经过验证
Jin-Goo ParkProfessor of Materials Engineering, Hanyang University在 hanyang.ac.kr 的电子邮件经过验证
Ian Ivar SuniDirector, Materials Technology Center; Professor of Chemical and Biomolecular Sciences; Professor of在 siu.edu 的电子邮件经过验证
Nagendra Prasad YerriboinaDirector of R&D, Advanced NanoSurface Technologies, Shenzhen在 anstinc.com 的电子邮件经过验证
Dr. Amrutha MSManager, Corrosion and Metallurgy studies, HPCL-Green R and D Center在 hpcl.in 的电子邮件经过验证
Manivannan RamachandranAssociate Professor, Dept. of Chemical Engineering, National Institute of Technology, Raipur, India在 nitrr.ac.in 的电子邮件经过验证
S.V. BabuClarkson University在 clarkson.edu 的电子邮件经过验证
RANJITH PUNATHIL MEETHALAssistant Professor, National Institute of Technology Calicut在 nitc.ac.in 的电子邮件经过验证
S Noyel VictoriaAsst. Professor, National Institute of Technology Raipur在 nitrr.ac.in 的电子邮件经过验证
BVS PraveenAssistant Professor, Chaitanya Bharathi Institute of Technology在 cbit.ac.in 的电子邮件经过验证
Vinod Kumar VenkatakrishnanProcess Research Engineer, Shell Oil Company在 shell.com 的电子邮件经过验证
S.V. BabuClarkson University在 clarkson.edu 的电子邮件经过验证
Abhijit P DeshpandeProfessor of Chemical Engineering, Indian Institute of Technology Madras, Chennai; 91-44-22574169在 iitm.ac.in 的电子邮件经过验证
Koduvayur A RamyaPostdoc researcher, Technical University of Munich, Forschungs-Neutronenquelle Heinz Maier-Leibnitz在 frm2.tum.de 的电子邮件经过验证
Pranav P. SharmaMicron Technology, Inc在 micron.com 的电子邮件经过验证
Josiah Jebaraj Johnley MuthurajProcess development Engineer - CMP在 micron.com 的电子邮件经过验证
Jeevan MaddalaAssistant Professor, West Virginia University在 mail.wvu.edu 的电子邮件经过验证
Krishnaraj SambathChevron Mid-Continent Business Unit在 chevron.com 的电子邮件经过验证
Karthik PushpavanamIndian Institute of Technology, Gandhinagar在 asu.edu 的电子邮件经过验证
Dr S NingshenIGCAR, India在 igcar.gov.in 的电子邮件经过验证

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Ramanathan Srinivasan

Department of Chemical Engineering, Indian Institute of Technology - Madras, India

在 iitm.ac.in 的电子邮件经过验证 - 首页

Electrochemistry


标题按引用次数排序按年份排序按标题排序	引用次数引用次数	年份
Microwave food processing—A review S Chandrasekaran, S Ramanathan, T Basak Food research international 52 (1), 243-261, 2013	1086	2013
Microwave material processing—a review S Chandrasekaran, S Ramanathan, T Basak AIChE Journal 58 (2), 330-363, 2012	366	2012
Experimental and theoretical investigation on microwave melting of metals S Chandrasekaran, T Basak, S Ramanathan Journal of Materials Processing Technology 211 (3), 482-487, 2011	170	2011
Shallow trench isolation chemical mechanical planarization: a review R Srinivasan, PVR Dandu, SV Babu ECS Journal of Solid State Science and Technology 4 (11), P5029, 2015	111	2015
Microwave heating characteristics of graphite based powder mixtures S Chandrasekaran, T Basak, R Srinivasan International Communications in Heat and Mass Transfer 48, 22-27, 2013	106	2013
Nonlinear electrochemical impedance spectroscopy F Fasmin, R Srinivasan Journal of The Electrochemical Society 164 (7), H443, 2017	99	2017
Chemical mechanical planarization of copper in alkaline slurry with uric acid as inhibitor YN Prasad, S Ramanathan Electrochimica Acta 52 (22), 6353-6358, 2007	90	2007
Facile fabrication of robust superhydrophobic aluminum surfaces with enhanced corrosion protection and antifouling properties SC Vanithakumari, D Nanda Gopala Krishna, RP George, R Srinivasan, ... Progress in Organic Coatings 162, 106560, 2022	83	2022
The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasives R Manivannan, S Ramanathan Applied Surface Science 255 (6), 3764-3768, 2009	67	2009
Characterization of TMAH based cleaning solution for post Cu-CMP application RP Venkatesh, TY Kwon, YN Prasad, S Ramanathan, JG Park Microelectronic engineering 102, 74-80, 2013	66	2013
Amino acid or carboxylic acid with halide functional group R Srinivasan, SV Babu, WG America, YS Her, EK Company, C University, ... US Patent 6,491,843, 2002	63*	2002
Effect of potential drifts and ac amplitude on the electrochemical impedance spectra SN Victoria, S Ramanathan Electrochimica Acta 56 (5), 2606-2615, 2011	53	2011
Slurry for chemical mechanical polishing silicon dioxide R Srinivasan, SV Babu, WG America, YS Her US Patent 6,468,910, 2002	53	2002
Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution R Manivannan, BJ Cho, X Hailin, S Ramanathan, JG Park Microelectronic engineering 122, 33-39, 2014	50	2014
A kinetic model for the anodic dissolution of Ti in HF in the active and passive regions F Fasmin, BVS Praveen, R Srinivasan Journal of The electrochemical society 162 (9), H604-H610, 2015	46	2015
Facile synthesis of palladium nanoclusters and their catalytic activity in Sonogashira coupling reactions J Athilakshmi, S Ramanathan, DK Chand Tetrahedron Letters 49 (36), 5286-5288, 2008	44	2008
Potassium bromate as an oxidizing agent in a titania-based Ru CMP slurry SN Victoria, PP Sharma, II Suni, S Ramanathan Electrochemical and Solid-State Letters 13 (11), H385, 2010	43	2010
Role of abrasives in high selectivity STI CMP slurries R Manivannan, S Ramanathan Microelectronic Engineering 85 (8), 1748-1753, 2008	41	2008
An Introduction to Electrochemical Impedance Spectroscopy R Srinivasan, F Fasmin Taylor & Francis, 2021	40	2021
Electrochemical impedance spectroscopy (EIS) analysis of BTA removal by TMAH during post Cu CMP cleaning process RP Venkatesh, BJ Cho, S Ramanathan, JG Park Journal of The Electrochemical Society 159 (11), C447, 2012	40	2012

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