| Reliable modular production quality narrow-band high REP rate excimer laser DW Myers, HA Besaucele, PP Das, TP Duffey, AI Ershov, IV Fomenkov, ... US Patent 6,128,323, 2000 | 188 | 2000 |
| Four KHz gas discharge laser system CJ Wittak, WN Partlo, RL Sandstrom, PC Melcher, DM Johns, RB Saethre, ... US Patent 6,882,674, 2005 | 41 | 2005 |
| Control technique for microlithography lasers P Zambon, GG Padmabandu, TA Watson, PP Das US Patent 6,392,743, 2002 | 35 | 2002 |
| Comparison between a FEL amplifier and oscillator P Zambon, WJ Witteman, PJM van der Slot Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 1994 | 27 | 1994 |
| Dual-chamber ultra line-narrowed excimer light source for 193-nm lithography VB Fleurov, DJ Colon III, DJW Brown, P O'Keeffe, H Besaucele, AI Ershov, ... Optical Microlithography XVI 5040, 1694-1703, 2003 | 25 | 2003 |
| Energy efficient lithography laser GG Padmabandu, PP Das, TA Watson, P Zambon US Patent 6,320,892, 2001 | 13 | 2001 |
| Method and apparatus for controlling the output of a gas discharge laser system JA Rule, P Zambon, TA Watson, OS Mesina, W Zheng US Patent 7,277,464, 2007 | 12 | 2007 |
| Dual-loop control for laser annealing of semiconductor wafers JT McWhirter, D Gaines, J Lee, P Zambon US Patent 8,691,598, 2014 | 11 | 2014 |
| Method and apparatus for controlling the output of a gas discharge MOPA laser system JA Rule, P Zambon US Patent 7,209,507, 2007 | 8 | 2007 |
| Production-ready 2-kHz KrF excimer laser for DUV lithography D Myers, TA Watson, PP Das, GG Padmabandu, P Zambon, T Hofmann, ... Optical Microlithography XII 3679, 1038-1049, 1999 | 8 | 1999 |
| Simple low cost tip-tilt wavefront sensor having extended dynamic range MJ Northcott, JE Graves, S Fleischer, P Zambon, J Tuttle, YC Chang US Patent 9,544,052, 2017 | 5 | 2017 |
| Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging [4562-112] I Lalovic, A Kroyan, P Zambon, CD Silsby, N Farrar PROCEEDINGS-SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING, 992-999, 2002 | 5 | 2002 |
| Investigation of cross-field wavefront aberrations of KrF lithography exposure systems as a function of excimer laser bandwidth I Lalovic, A Kroyan, NR Farrar, D Taitano, P Zambon, A SmithÀ Proc. SPIE 4346, 1263, 2001 | 5 | 2001 |
| Design of a 30 GHz Bragg reflector for a Raman FEL P Zambon, PJM Van der Slot Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 1994 | 5 | 1994 |
| All-glass kW fibre laser end-pumped by MCCP-cooled diode stacks J Minelly, L Spinelli, R Tumminelli, S Govorkov, D Anthon, E Pooler, ... The European Conference on Lasers and Electro-Optics, CJ_P14, 2011 | 4 | 2011 |
| Emission feedback control system for sub-millisecond laser spike anneal JT McWhirter, D Gaines, P Zambon 2008 16th IEEE International Conference on Advanced Thermal Processing of …, 2008 | 4 | 2008 |
| Illumination spectral width impacts on mask error enhancement factor and iso-dense bias in 0.6-NA KrF imaging I Lalovic, A Kroyan, P Zambon, CD Silsby, NR Farrar 21st Annual BACUS Symposium on Photomask Technology 4562, 992-999, 2002 | 4 | 2002 |
| High power laser output beam energy density reduction R Rao, W Zhang, J Howey, G Padmabandu, P Zambon, R Sandstrom US Patent App. 10/925,746, 2005 | 3 | 2005 |
| HyshamC., Dunning R D Myers, DPP Watson ТА, WN Partlo, PGG Hofmann Т, P Zambon Proc. SPIE 3679, 114, 1999 | 3 | 1999 |
| Extending the performance of KrF laser for microlithography by using novel F2 control technology P Zambon, M Gong, J Carlesi, GG Padmabandu, M Binder, K Swanson, ... Optical Microlithography XIII 4000, 1461-1470, 2000 | 2 | 2000 |
