Recommended methods to study resistive switching devices M Lanza, HSP Wong, E Pop, D Ielmini, D Strukov, BC Regan, L Larcher, ... Advanced Electronic Materials 5 (1), 1800143, 2019 | 583 | 2019 |
Resistive switching: from fundamentals of nanoionic redox processes to memristive device applications D Ielmini, R Waser John Wiley & Sons, 2015 | 575 | 2015 |
Intrinsic switching variability in HfO2RRAM A Fantini, L Goux, R Degraeve, DJ Wouters, N Raghavan, G Kar, ... 2013 5th IEEE International Memory Workshop, 30-33, 2013 | 255 | 2013 |
Standards for the characterization of endurance in resistive switching devices M Lanza, R Waser, D Ielmini, JJ Yang, L Goux, J Suñe, AJ Kenyon, ... ACS nano 15 (11), 17214-17231, 2021 | 160 | 2021 |
Improvement of data retention in HfO2/Hf 1T1R RRAM cell under low operating current YY Chen, M Komura, R Degraeve, B Govoreanu, L Goux, A Fantini, ... 2013 IEEE International Electron Devices Meeting, 10.1. 1-10.1. 4, 2013 | 137 | 2013 |
Causes and consequences of the stochastic aspect of filamentary RRAM R Degraeve, A Fantini, N Raghavan, L Goux, S Clima, B Govoreanu, ... Microelectronic Engineering 147, 171-175, 2015 | 119 | 2015 |
A framework to practical predictive maintenance modeling for multi-state systems CM Tan, N Raghavan Reliability Engineering & System Safety 93 (8), 1138-1150, 2008 | 116 | 2008 |
Heuristic Kalman optimized particle filter for remaining useful life prediction of lithium-ion battery PLT Duong, N Raghavan Microelectronics Reliability 81, 232-243, 2018 | 106 | 2018 |
Intrinsic nanofilamentation in resistive switching X Wu, D Cha, M Bosman, N Raghavan, DB Migas, VE Borisenko, ... Journal of Applied Physics 113 (11), 2013 | 87 | 2013 |
Microscopic origin of random telegraph noise fluctuations in aggressively scaled RRAM and its impact on read disturb variability N Raghavan, R Degraeve, A Fantini, L Goux, S Strangio, B Govoreanu, ... 2013 IEEE International Reliability Physics Symposium (IRPS), 5E. 3.1-5E. 3.7, 2013 | 84 | 2013 |
Data-driven design space exploration and exploitation for design for additive manufacturing Y Xiong, PLT Duong, D Wang, SI Park, Q Ge, N Raghavan, DW Rosen Journal of Mechanical Design 141 (10), 101101, 2019 | 79 | 2019 |
Stochastic variability of vacancy filament configuration in ultra-thin dielectric RRAM and its impact on OFF-state reliability N Raghavan, R Degraeve, A Fantini, L Goux, DJ Wouters, ... 2013 IEEE International Electron Devices Meeting, 21.1. 1-21.1. 4, 2013 | 67 | 2013 |
Conductive atomic force microscope study of bipolar and threshold resistive switching in 2D hexagonal boron nitride films A Ranjan, N Raghavan, SJ O’shea, S Mei, M Bosman, K Shubhakar, ... Scientific reports 8 (1), 2854, 2018 | 63 | 2018 |
Evolution of Filament Formation in Ni/HfO2/SiOx/Si‐Based RRAM Devices X Wu, S Mei, M Bosman, N Raghavan, X Zhang, D Cha, K Li, KL Pey Advanced Electronic Materials 1 (11), 1500130, 2015 | 57 | 2015 |
Nanostructure and nanomaterial characterization, growth mechanisms, and applications CI Ossai, N Raghavan Nanotechnology Reviews 7 (2), 209-231, 2018 | 56 | 2018 |
Study of preferential localized degradation and breakdown of HfO2/SiOx dielectric stacks at grain boundary sites of polycrystalline HfO2 dielectrics K Shubhakar, KL Pey, N Raghavan, SS Kushvaha, M Bosman, Z Wang, ... Microelectronic engineering 109, 364-369, 2013 | 54 | 2013 |
Evidence for compliance controlled oxygen vacancy and metal filament based resistive switching mechanisms in RRAM N Raghavan, KL Pey, W Liu, X Wu, X Li, M Bosman Microelectronic Engineering 88 (7), 1124-1128, 2011 | 54 | 2011 |
Hourglass concept for RRAM: a dynamic and statistical device model R Degraeve, A Fantini, N Raghavan, L Goux, S Clima, YY Chen, ... Proceedings of the 21th International Symposium on the Physical and Failure …, 2014 | 53 | 2014 |
Statistical insight into controlled forming and forming free stacks for HfOx RRAM N Raghavan, A Fantini, R Degraeve, PJ Roussel, L Goux, B Govoreanu, ... Microelectronic Engineering 109, 177-181, 2013 | 53 | 2013 |
A novel framework for semiconductor manufacturing final test yield classification using machine learning techniques D Jiang, W Lin, N Raghavan Ieee Access 8, 197885-197895, 2020 | 51 | 2020 |