关注
Karol Frohlich
Karol Frohlich
在 savba.sk 的电子邮件经过验证
标题
引用次数
引用次数
年份
Growth of high-dielectric-constant TiO2 films in capacitors with RuO2 electrodes
K Fröhlich, M Ťapajna, A Rosová, E Dobročka, K Hušeková, J Aarik, ...
Electrochemical and Solid-State Letters 11 (6), G19, 2008
962008
Gate insulation and drain current saturation mechanism in InAlN∕ GaN metal-oxide-semiconductor high-electron-mobility transistors
G Pozzovivo, J Kuzmik, S Golka, W Schrenk, G Strasser, D Pogany, ...
Applied Physics Letters 91 (4), 2007
952007
Ultrathin InAlN/AlN barrier HEMT with high performance in normally off operation
C Ostermaier, G Pozzovivo, JFÇ Carlin, B Basnar, W Schrenk, Y Douvry, ...
IEEE Electron Device Letters 30 (10), 1030-1032, 2009
792009
3D resistive RAM cell design for high-density storage class memory—a review
B Hudec, CW Hsu, IT Wang, WL Lai, CC Chang, T Wang, K Fröhlich, ...
Science China Information Sciences 59, 1-21, 2016
742016
Ru and RuO2 gate electrodes for advanced CMOS technology
K Fröhlich, K Husekova, D Machajdik, JC Hooker, N Perez, M Fanciulli, ...
Materials Science and Engineering: B 109 (1-3), 117-121, 2004
742004
Effect of crystallinity on the magnetoresistive properties of thin films grown by chemical vapor deposition
S Pignard, H Vincent, JP Senateur, K Fröhlich, J Šouc
Applied physics letters 73 (7), 999-1001, 1998
611998
Growth and recrystallization of CeO2 thin films deposited on R-plane sapphire by off-axis RF sputtering
M Španková, I Vávra, Š Gaži, D Machajdık, Š Chromik, K Fröhlich, ...
Journal of crystal growth 218 (2-4), 287-293, 2000
552000
Epitaxial growth of high- rutile films on electrodes
K Fröhlich, J Aarik, M Ťapajna, A Rosová, A Aidla, E Dobročka, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009
522009
Application of Ru-based gate materials for CMOS technology
P Písec, R Lupták, K Hus, K Fröhlich, L Harmatha, JC Hooker, ...
Materials science in semiconductor processing 7 (4-6), 271-276, 2004
522004
Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology
P Pisecny, K Husekova, K Frohlich, L Harmatha, J Soltys, D Machajdik, ...
Materials science in semiconductor processing 7 (4-6), 231-236, 2004
512004
Structure, grain connectivity and pinning of as-deformed commercial MgB2 powder in Cu and Fe/Cu sheaths
P Kovac, I Hušek, W Pachla, T Melišek, R Diduszko, K Fröhlich, ...
Superconductor Science and Technology 15 (7), 1127, 2002
492002
Thermally induced voltage shift in capacitance–voltage characteristics and its relation to oxide/semiconductor interface states in Ni/Al2O3/InAlN/GaN heterostructures
M Ťapajna, K Čičo, J Kuzmík, D Pogany, G Pozzovivo, G Strasser, ...
Semiconductor science and technology 24 (3), 035008, 2009
482009
RF Performance of InAlN/GaN HFETs and MOSHFETs With up to 21
P Kordos, M Mikulics, A Fox, D Gregusova, K Cico, JF Carlin, ...
IEEE electron device letters 31 (3), 180-182, 2010
462010
Proposal and Performance Analysis of Normally Off GaN/InAlN/AlN/GaN HEMTs With 1-nm-Thick InAlN Barrier
J Kuzmik, C Ostermaier, G Pozzovivo, B Basnar, W Schrenk, JF Carlin, ...
IEEE transactions on electron devices 57 (9), 2144-2154, 2010
452010
Schottky-barrier normally off GaN/InAlN/AlN/GaN HEMT with selectively etched access region
M Jurkovic, D Gregusova, V Palankovski, Š Hascik, M Blaho, K Cico, ...
IEEE electron device letters 34 (3), 432-434, 2013
412013
Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor
B Hudec, K Hušeková, A Rosová, J Šoltýs, R Rammula, A Kasikov, ...
Journal of Physics D: Applied Physics 46 (38), 385304, 2013
402013
Electrical properties of InAlN/GaN high electron mobility transistor with Al2O3, ZrO2, and GdScO3 gate dielectrics
K Čičo, K Hušeková, M Ťapajna, D Gregušová, R Stoklas, J Kuzmík, ...
Journal of Vacuum Science & Technology B 29 (1), 2011
402011
Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors
L Aarik, T Arroval, R Rammula, H Mändar, V Sammelselg, B Hudec, ...
Thin Solid Films 565, 19-24, 2014
392014
Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes
B Hudec, K Hušeková, A Tarre, JH Han, S Han, A Rosová, W Lee, ...
Microelectronic engineering 88 (7), 1514-1516, 2011
392011
Injection MOCVD: ferroelectric thin films and functional oxide superlattices
F Weiss, J Lindner, JP Senateur, C Dubourdieu, V Galindo, M Audier, ...
Surface and Coatings Technology 133, 191-197, 2000
392000
系统目前无法执行此操作,请稍后再试。
文章 1–20