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Gate insulation and drain current saturation mechanism in InAlN∕ GaN metal-oxide-semiconductor high-electron-mobility transistors G Pozzovivo, J Kuzmik, S Golka, W Schrenk, G Strasser, D Pogany, ... Applied Physics Letters 91 (4), 2007 | 95 | 2007 |
Ultrathin InAlN/AlN barrier HEMT with high performance in normally off operation C Ostermaier, G Pozzovivo, JFÇ Carlin, B Basnar, W Schrenk, Y Douvry, ... IEEE Electron Device Letters 30 (10), 1030-1032, 2009 | 79 | 2009 |
3D resistive RAM cell design for high-density storage class memory—a review B Hudec, CW Hsu, IT Wang, WL Lai, CC Chang, T Wang, K Fröhlich, ... Science China Information Sciences 59, 1-21, 2016 | 74 | 2016 |
Ru and RuO2 gate electrodes for advanced CMOS technology K Fröhlich, K Husekova, D Machajdik, JC Hooker, N Perez, M Fanciulli, ... Materials Science and Engineering: B 109 (1-3), 117-121, 2004 | 74 | 2004 |
Effect of crystallinity on the magnetoresistive properties of thin films grown by chemical vapor deposition S Pignard, H Vincent, JP Senateur, K Fröhlich, J Šouc Applied physics letters 73 (7), 999-1001, 1998 | 61 | 1998 |
Growth and recrystallization of CeO2 thin films deposited on R-plane sapphire by off-axis RF sputtering M Španková, I Vávra, Š Gaži, D Machajdık, Š Chromik, K Fröhlich, ... Journal of crystal growth 218 (2-4), 287-293, 2000 | 55 | 2000 |
Epitaxial growth of high- rutile films on electrodes K Fröhlich, J Aarik, M Ťapajna, A Rosová, A Aidla, E Dobročka, ... Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2009 | 52 | 2009 |
Application of Ru-based gate materials for CMOS technology P Písec, R Lupták, K Hus, K Fröhlich, L Harmatha, JC Hooker, ... Materials science in semiconductor processing 7 (4-6), 271-276, 2004 | 52 | 2004 |
Growth of lanthanum oxide films for application as a gate dielectric in CMOS technology P Pisecny, K Husekova, K Frohlich, L Harmatha, J Soltys, D Machajdik, ... Materials science in semiconductor processing 7 (4-6), 231-236, 2004 | 51 | 2004 |
Structure, grain connectivity and pinning of as-deformed commercial MgB2 powder in Cu and Fe/Cu sheaths P Kovac, I Hušek, W Pachla, T Melišek, R Diduszko, K Fröhlich, ... Superconductor Science and Technology 15 (7), 1127, 2002 | 49 | 2002 |
Thermally induced voltage shift in capacitance–voltage characteristics and its relation to oxide/semiconductor interface states in Ni/Al2O3/InAlN/GaN heterostructures M Ťapajna, K Čičo, J Kuzmík, D Pogany, G Pozzovivo, G Strasser, ... Semiconductor science and technology 24 (3), 035008, 2009 | 48 | 2009 |
RF Performance of InAlN/GaN HFETs and MOSHFETs With up to 21 P Kordos, M Mikulics, A Fox, D Gregusova, K Cico, JF Carlin, ... IEEE electron device letters 31 (3), 180-182, 2010 | 46 | 2010 |
Proposal and Performance Analysis of Normally Off GaN/InAlN/AlN/GaN HEMTs With 1-nm-Thick InAlN Barrier J Kuzmik, C Ostermaier, G Pozzovivo, B Basnar, W Schrenk, JF Carlin, ... IEEE transactions on electron devices 57 (9), 2144-2154, 2010 | 45 | 2010 |
Schottky-barrier normally off GaN/InAlN/AlN/GaN HEMT with selectively etched access region M Jurkovic, D Gregusova, V Palankovski, Š Hascik, M Blaho, K Cico, ... IEEE electron device letters 34 (3), 432-434, 2013 | 41 | 2013 |
Impact of plasma treatment on electrical properties of TiO2/RuO2 based DRAM capacitor B Hudec, K Hušeková, A Rosová, J Šoltýs, R Rammula, A Kasikov, ... Journal of Physics D: Applied Physics 46 (38), 385304, 2013 | 40 | 2013 |
Electrical properties of InAlN/GaN high electron mobility transistor with Al2O3, ZrO2, and GdScO3 gate dielectrics K Čičo, K Hušeková, M Ťapajna, D Gregušová, R Stoklas, J Kuzmík, ... Journal of Vacuum Science & Technology B 29 (1), 2011 | 40 | 2011 |
Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors L Aarik, T Arroval, R Rammula, H Mändar, V Sammelselg, B Hudec, ... Thin Solid Films 565, 19-24, 2014 | 39 | 2014 |
Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes B Hudec, K Hušeková, A Tarre, JH Han, S Han, A Rosová, W Lee, ... Microelectronic engineering 88 (7), 1514-1516, 2011 | 39 | 2011 |
Injection MOCVD: ferroelectric thin films and functional oxide superlattices F Weiss, J Lindner, JP Senateur, C Dubourdieu, V Galindo, M Audier, ... Surface and Coatings Technology 133, 191-197, 2000 | 39 | 2000 |