h5 指数是指在过去整整 5 年中所发表文章的 h 指数。h 指在 2019-2023 年间发表的 h 篇文章每篇至少都被引用过 h 次的最大值。隐藏
出版物的 h5 中位数，是指出版物的 h5 指数所涵盖的所有文章获得的引用次数的中位值。隐藏
- #12 Electrochemistry
| 标题/作者 | 引用次数 | 年份 |
|---|---|---|
T Liu, L Xie, J Yang, R Kong, G Du, AM Asiri, X Sun, L Chen ChemElectroChem 4 (8), 1840-1845 | 334 | 2017 |
L Liu, Y Zhou, S Liu, M Xu ChemElectroChem 5 (1), 6-19 | 234 | 2018 |
ETSG da Silva, DEP Souto, JTC Barragan, J de F. Giarola, ... ChemElectroChem 4 (4), 778-794 | 171 | 2017 |
X Lou, C Lin, Q Luo, J Zhao, B Wang, J Li, Q Shao, X Guo, N Wang, Z Guo ChemElectroChem 4 (12), 3171-3180 | 147 | 2017 |
L Feng, H Xue ChemElectroChem 4 (1), 20-34 | 135 | 2017 |
J Resasco, Y Lum, E Clark, JZ Zeledon, AT Bell ChemElectroChem 5 (7), 1064-1072 | 129 | 2018 |
D Liu, L Tao, D Yan, Y Zou, S Wang ChemElectroChem 5 (14), 1775-1785 | 124 | 2018 |
A Mitha, AZ Yazdi, M Ahmed, P Chen ChemElectroChem 5 (17), 2409-2418 | 122 | 2018 |
D Majumdar, T Maiyalagan, Z Jiang ChemElectroChem 6 (17), 4343-4372 | 110 | 2019 |
JE Pander III, D Ren, Y Huang, NWX Loo, SHL Hong, BS Yeo ChemElectroChem 5 (2), 219-237 | 108 | 2018 |
G Fu, Y Tang, JM Lee ChemElectroChem 5 (11), 1424-1434 | 105 | 2018 |
Y Wu, P Nie, J Jiang, B Ding, H Dou, X Zhang ChemElectroChem 4 (6), 1560-1565 | 102 | 2017 |
H Erikson, A Sarapuu, K Tammeveski ChemElectroChem 6 (1), 73-86 | 97 | 2019 |
PV Nidheesh, G Divyapriya, N Oturan, C Trellu, MA Oturan ChemElectroChem 6 (8), 2124-2142 | 95 | 2019 |
Y Xu, B Zhang ChemElectroChem 6 (13), 3214-3226 | 95 | 2019 |
S Lips, SR Waldvogel ChemElectroChem 6 (6), 1649-1660 | 87 | 2019 |
S Li, G Zhang, X Tu, J Li ChemElectroChem 5 (4), 701-707 | 87 | 2018 |
X Zang, C Shen, M Sanghadasa, L Lin ChemElectroChem 6 (4), 976-988 | 87 | 2019 |
Q Hou, J Ren, H Chen, P Yang, Q Shao, M Zhao, X Zhao, H He, N Wang, ... ChemElectroChem 5 (5), 726-731 | 86 | 2018 |
A Shatskiy, H Lundberg, MD Kärkäs ChemElectroChem 6 (16), 4067-4092 | 86 | 2019 |
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计算机程序会自动估算并确定日期和引用次数。