Direct writing of lateral fluorographene nanopatterns with tunable bandgaps and its application in new generation of moiré superlattice
One of the primary goals for monolayer device fabrications and an ideal model of graphene
as an atomic thin “canvas” is one that permits semiconducting/insulating lateral
nanopatterns to be freely and directly drawn on the semimetallic graphene surface. This
work demonstrates a reversible electron-beam-activated technique that allows direct writing
of semiconducting/insulating fluorographene lateral nanopatterns with tunable bandgaps on
the graphene surface with a resolution down to 9–15 nm. This approach overcomes the …
as an atomic thin “canvas” is one that permits semiconducting/insulating lateral
nanopatterns to be freely and directly drawn on the semimetallic graphene surface. This
work demonstrates a reversible electron-beam-activated technique that allows direct writing
of semiconducting/insulating fluorographene lateral nanopatterns with tunable bandgaps on
the graphene surface with a resolution down to 9–15 nm. This approach overcomes the …
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