Hierarchical, self-assembled metasurfaces via exposure-controlled reflow of block copolymer-derived nanopatterns
AA Kulkarni, GS Doerk - ACS Applied Materials & Interfaces, 2022 - ACS Publications
Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns.
AA Kulkarni, GS Doerk - ACS Applied Materials & Interfaces, 2022 - europepmc.org
Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns
AA Kulkarni, GS Doerk - ACS applied materials & interfaces - pubmed.ncbi.nlm.nih.gov
Nanopatterning for the fabrication of optical metasurfaces entails a need for high-resolution
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
approaches like electron beam lithography that cannot be readily scaled beyond prototyping …
Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns
AA Kulkarni, GS Doerk - ACS Applied Materials and Interfaces, 2022 - osti.gov
Here, nanopatterning for the fabrication of optical metasurfaces entails a need for high-
resolution approaches like electron beam lithography that cannot be readily scaled beyond …
resolution approaches like electron beam lithography that cannot be readily scaled beyond …