High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte, S Ndoni… - Journal of colloid and …, 2019 - Elsevier
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …
被引用次数：31 相关文章

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte… - Journal of Colloid …, 2018 - researchportal.tuni.fi
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte, S Ndoni… - Journal of Colloid and …, 2019 - orbit.dtu.dk
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures.

S Rasappa, H Hulkkonen, L Schulte… - Journal of Colloid and …, 2018 - europepmc.org
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …

[引用][C] High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte… - Journal of Colloid …, 2019 - ui.adsabs.harvard.edu
High molecular weight block copolymer lithography for nanofabrication of hard mask and
photonic nanostructures - NASA/ADS Now on home page ads icon ads Enable full ADS view …

High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte… - Journal of colloid …, 2019 - pubmed.ncbi.nlm.nih.gov
An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-
block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent …

[引用][C] High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

S Rasappa, H Hulkkonen, L Schulte, S Ndoni, J Reuna… - 2019