[HTML][HTML] Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
Indirect bandgap of multilayer molybdenum disulfide has been recognized as a major
hindrance to high responsivity of MoS2 phototransistors. Here, to overcome this fundamental …
hindrance to high responsivity of MoS2 phototransistors. Here, to overcome this fundamental …
Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
H Park, J Lee, G Han, AA AlMutairi… - Communications …, 2021 - ui.adsabs.harvard.edu
Indirect bandgap of multilayer molybdenum disulfide has been recognized as a major
hindrance to high responsivity of MoS 2 phototransistors. Here, to overcome this …
hindrance to high responsivity of MoS 2 phototransistors. Here, to overcome this …
Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
P Heekyeong, J Lee, H Gyuchull… - Communications …, 2021 - search.proquest.com
Indirect bandgap of multilayer molybdenum disulfide has been recognized as a major
hindrance to high responsivity of MoS 2 phototransistors. Here, to overcome this …
hindrance to high responsivity of MoS 2 phototransistors. Here, to overcome this …
Nano-patterning on multilayer MoS2 via block copolymer lithography for highly sensitive and responsive phototransistors
H Park, J Lee, G Han, A AlMutairi… - …, 2021 - scholarworks.bwise.kr
Indirect bandgap of multilayer molybdenum disulfide has been recognized as a major
hindrance to high responsivity of MoS2 phototransistors. Here, to overcome this fundamental …
hindrance to high responsivity of MoS2 phototransistors. Here, to overcome this fundamental …