… nor sufficiently robust for wafer-scale nanopatterning. Recently… used as an etch mask to
pattern Cr with a film thickness of 5–… Direct nanopatterning of Si and Cr hard masks was obtained …

… as an inexpensive, robust, and reliable patterning method. As … films, which often cannot
provide necessary nanopatterns. … the PNM layer with a shadow mask using UVO or an oxygen …

… Because of a strong acid of HF, its concentration in DI water has to be as small as possible
… as a mask. When we used dual nanopatterns on the silicon substrate as an etching mask, a …

… of block copolymer-based nanopatterning and highlights … self-assembled block copolymer
nanopatterns and improved … polymer removal by ashing produced robust etch masks for highly …

… thick film (ie, more than 1 μm) based on BCP nanopatterning, … of BCP nanopatterns with
mechanically robust micropatterns … Using a BCP nanopattern as a patterning mask, electrodes …

… Furthermore, although the smallest shadow mask feature we … By applying our method to thin
film nanopatterns formed by … -range order, highlights their strong potential for the fabrication …

… Recent nanopatterning approaches have allowed fabrication of bioinspired nanostructured
… weight block copolymers (to enable masks with higher periodicity), that still have reliable …

… a useful and reliable dual nanopatterning method capable of … desired surfaces by controlling
the film thickness of BCPs, the … The remaining PR patterns were used as an etch mask to …

… simulations to specify the design rules for block copolymer (BCP) materials for use in the …
film, followed by an Ar/O 2 etch, leaving a line-space pattern of alumina as an etch mask (Fig…

… copolymer (RCP) as well as to prevent damage to MoS 2 during the etching process 26,31,37
. The BCP was spin-coated on the RCP film … The BCP nanotemplate was used as a mask …