Directed self-assembly strategies for orientation-controlled block copolymers for advanced lithography.

CG Correia - 2019 - theses.hal.science
… -assembled nanopatterns could be used as lithographic masks … in thin film as well as their
interest for nanolithography. Finally… The PAG is a specie that generates a strong acid (Lewis or …

[PDF][PDF] Block copolymer-based hybrid nanomaterials for nanoimprint applications

P Sellin, I Maximov - 2022 - lup.lub.lu.se
… how the nanopattern was created, the section about block … pyridine group in P2VP, which
is a strong Lewis base [23, 29]. … etch masks contain heavier elements than polymers typically …

Block Copolymer Self-assembly: From Process Optimization to Optical Properties

GK Ginige - 2022 - era.library.ualberta.ca
nanopatterns from metal ion-loaded thin films of PS-b-P2VP BCPs to generate single layers
of hexagonal metal nanopatterns … during the tough time of writing this thesis and studying. …

… Microphase Separation by Dynamic Interplay of Crystallization and Microphase Separation in Semicrystalline PEO-Rich PS-b-PEO Block Copolymer Thin Films

T Rejek, P Schweizer, D Joch, L Portilla… - …, 2020 - ACS Publications
… The highly diluted and separated BCP chains (Figure 6a) in solution start to aggregate
when the polymer concentration rises upon solvent evaporation. In this stage, the strong block

[PDF][PDF] Block copolymer templates for metal oxide nanostructures

A Talla - 2019 - core.ac.uk
… a nano-mask from a di-block copolymer thin film, for zinc oxide … In fact, diblock copolymers
have a strong tendency to form … di-block copolymer thin films used for nano-patterning. It is …

Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics

YH Suh, DW Shin, YT Chun - RSC advances, 2019 - pubs.rsc.org
… has received increased attention as a strong candidate for the … plasmon polariton with
periodic metal masks, 27 and beam … to form nanopatterned active layer films of inorganic SBMs …

[HTML][HTML] Degradable block copolymer-derived nanoporous membranes and their applications

Y Zhai, C Li, L Gao - Giant, 2023 - Elsevier
… : separation membranes, nanotemplates and etched masks. DBCP-derived nanoporous …
strong degradation contrast with other organic blocks due to its recalcitrant property. The strong

Macroscopic alignment of block copolymers on silicon substrates by laser annealing

AA Leniart, P Pula, A Sitkiewicz, PW Majewski - ACS nano, 2020 - ACS Publications
… We tested the robustness of our patterning method by transferring the aligned BCP films
onto colloidal silica particles (∼800 nm in diameter) sparsely deposited on a Si surface. …

Optimization and control of large block copolymer self-assembly via precision solvent vapor annealing

A Selkirk, N Prochukhan, R Lundy, C Cummins… - …, 2021 - ACS Publications
… of the solvent inside the polymer film ϕ s . D sw is well … mask (from a nickel nitrate precursor)
was instead used. This is because it was found that the nickel oxide mask was more durable

Rapid and selective deposition of patterned thin films on heterogeneous substrates via spin coating

Y Zhang, CA D'Ambra, R Katsumata… - … applied materials & …, 2019 - ACS Publications
… (Figure S2), which illustrates the robustness of this surface functionalization process and the
… , Austin Abrams for help with the mask design for photolithography, and Athina Anastasaki …