Directed self-assembly strategies for orientation-controlled block copolymers for advanced lithography.
CG Correia - 2019 - theses.hal.science
… -assembled nanopatterns could be used as lithographic masks … in thin film as well as their
interest for nanolithography. Finally… The PAG is a specie that generates a strong acid (Lewis or …
interest for nanolithography. Finally… The PAG is a specie that generates a strong acid (Lewis or …
[PDF][PDF] Block copolymer-based hybrid nanomaterials for nanoimprint applications
P Sellin, I Maximov - 2022 - lup.lub.lu.se
… how the nanopattern was created, the section about block … pyridine group in P2VP, which
is a strong Lewis base [23, 29]. … etch masks contain heavier elements than polymers typically …
is a strong Lewis base [23, 29]. … etch masks contain heavier elements than polymers typically …
Block Copolymer Self-assembly: From Process Optimization to Optical Properties
GK Ginige - 2022 - era.library.ualberta.ca
… nanopatterns from metal ion-loaded thin films of PS-b-P2VP BCPs to generate single layers
of hexagonal metal nanopatterns … during the tough time of writing this thesis and studying. …
of hexagonal metal nanopatterns … during the tough time of writing this thesis and studying. …
… Microphase Separation by Dynamic Interplay of Crystallization and Microphase Separation in Semicrystalline PEO-Rich PS-b-PEO Block Copolymer Thin Films
… The highly diluted and separated BCP chains (Figure 6a) in solution start to aggregate
when the polymer concentration rises upon solvent evaporation. In this stage, the strong block …
when the polymer concentration rises upon solvent evaporation. In this stage, the strong block …
[PDF][PDF] Block copolymer templates for metal oxide nanostructures
A Talla - 2019 - core.ac.uk
… a nano-mask from a di-block copolymer thin film, for zinc oxide … In fact, diblock copolymers
have a strong tendency to form … di-block copolymer thin films used for nano-patterning. It is …
have a strong tendency to form … di-block copolymer thin films used for nano-patterning. It is …
Micro-to-nanometer patterning of solution-based materials for electronics and optoelectronics
YH Suh, DW Shin, YT Chun - RSC advances, 2019 - pubs.rsc.org
… has received increased attention as a strong candidate for the … plasmon polariton with
periodic metal masks, 27 and beam … to form nanopatterned active layer films of inorganic SBMs …
periodic metal masks, 27 and beam … to form nanopatterned active layer films of inorganic SBMs …
[HTML][HTML] Degradable block copolymer-derived nanoporous membranes and their applications
Y Zhai, C Li, L Gao - Giant, 2023 - Elsevier
… : separation membranes, nanotemplates and etched masks. DBCP-derived nanoporous …
strong degradation contrast with other organic blocks due to its recalcitrant property. The strong …
strong degradation contrast with other organic blocks due to its recalcitrant property. The strong …
Macroscopic alignment of block copolymers on silicon substrates by laser annealing
AA Leniart, P Pula, A Sitkiewicz, PW Majewski - ACS nano, 2020 - ACS Publications
… We tested the robustness of our patterning method by transferring the aligned BCP films
onto colloidal silica particles (∼800 nm in diameter) sparsely deposited on a Si surface. …
onto colloidal silica particles (∼800 nm in diameter) sparsely deposited on a Si surface. …
Optimization and control of large block copolymer self-assembly via precision solvent vapor annealing
… of the solvent inside the polymer film ϕ s . D sw is well … mask (from a nickel nitrate precursor)
was instead used. This is because it was found that the nickel oxide mask was more durable …
was instead used. This is because it was found that the nickel oxide mask was more durable …
Rapid and selective deposition of patterned thin films on heterogeneous substrates via spin coating
… (Figure S2), which illustrates the robustness of this surface functionalization process and the
… , Austin Abrams for help with the mask design for photolithography, and Athina Anastasaki …
… , Austin Abrams for help with the mask design for photolithography, and Athina Anastasaki …