This paper reports the thickness dependent structural, optical and electrical properties of tin monosulfide (SnS) films. SnS films of different thickness were grown (at 24 °C) by chemical bath deposition. Films of different thicknesses were obtained by varying the number of deposition cycles (2, 3, 4, 5 and 6 cycles; one cycle = 4.25 h). All films were examined by employing different experimental techniques. XRD results showed the occurrence of cubic π-phase in all films. FTIR spectra confirmed the occurrence of main peaks corresponding to Sn–S bond stretching in all films. Atomic force microscopy (AFM) analysis of all films showed non-uniform grain distribution with porous surface morphology. Surface roughness was found to increase (32 ± 1 nm to 72 ± 1 nm) with increase in film thickness. Optical measurements showed that the films exhibited direct energy band gap, E_g. The E_g was found to increase from 1.70 eV to 1.74 eV with increase (374 ± 5 nm to 723 ± 8 nm) in film thickness. All films exhibited high absorption coefficient α (≥10⁴ cm⁻¹) in the visible region. Film with lower thickness (374 nm) exhibited higher absorption coefficient. Electrical measurement of the films revealed that the electrical resistivity ρ had strong dependence on film thickness. The electrical resistivity ρ was found to increase (1.592 × 10³ Ω cm to 1.785 × 10⁴ Ω cm) with increase in film thickness. All results suggested that the optical response and electrical conductivity could be tuned through appropriate choice of film thickness by maintaining the cubic structure.