Fabrication of Dual Nanopatterns by Spatial Control of Nanodomain Orientation of Block Copolymer Thin Films

C Choi, J Jang, SY Park, J Lee… - ACS Applied Polymer …, 2020 - ACS Publications
Block copolymers (BCPs) with various types of nanodomains have potential application to
next-generation nanolithography and storage media because of relatively low cost and time …

Polydimethylsiloxane-assisted alignment transition from perpendicular to parallel of cylindrical microdomains in block copolymer films

X Zheng, Z Li, Y Zhao, T Qu, S Cao, P Wang, Y Li… - RSC …, 2016 - pubs.rsc.org
The orientation transition from perpendicular to parallel alignment of PEO cylindrical
microdomains within PEO-b-PMA (Az) films has been demonstrated via introducing a small …

Dual nanopatterns consisting of both nanodots and nanoholes on a single substrate

C Choi, M Go, SY Park, S Kang, Y Seo… - … applied materials & …, 2019 - ACS Publications
Block copolymers (BCPs) with various nanostructures such as spheres, cylinders, gyroid,
and lamellae, have received great attention for their application in nanolithography through …

Self-assembled block polymer templates as high resolution lithographic masks

K Aissou, M Kogelschatz, T Baron, P Gentile - Surface science, 2007 - Elsevier
Diblock copolymer thin films have recently received more attention due to their ability to
organize into nanometric structures under thermal annealing. This phenomenon was …

High Aspect Ratio PS-b-PMMA Block Copolymer Masks for Lithographic Applications

F Ferrarese Lupi, TJ Giammaria, FG Volpe… - … applied materials & …, 2014 - ACS Publications
The control of the self-assembly (SA) process and nanostructure orientation in diblock
copolymer (DBC) thick films is a crucial technological issue. Perpendicular orientation of the …

Vacuum-Driven Orientation of Nanostructured Diblock Copolymer Thin Films

AS Panda, YC Lee, CJ Hung, KP Liu, CY Chang… - ACS …, 2022 - ACS Publications
This work aims to demonstrate a facile method for the controlled orientation of
nanostructures of block copolymer (BCP) thin films. A simple diblock copolymer system …

Spatial arrangement of block copolymer nanopatterns using a photoactive homopolymer substrate

Z Jiang, MM Alam, HH Cheng, I Blakey… - Nanoscale …, 2019 - pubs.rsc.org
Spatial control of the orientation of block copolymers (BCPs) in thin films offers enormous
opportunities for practical nanolithography applications. In this study, we demonstrate the …

Large-area nanosquare arrays from shear-aligned block copolymer thin films

SY Kim, A Nunns, J Gwyther, RL Davis, I Manners… - Nano …, 2014 - ACS Publications
While block copolymer lithography has been broadly applied as a bottom-up patterning
technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel …

Silicon-containing block copolymers for lithographic applications

TY Lo, MR Krishnan, KY Lu, RM Ho - Progress in Polymer Science, 2018 - Elsevier
This comprehensive review, summarizes recent advances in the fabrication of well-ordered
block copolymer (BCP) thin films by different methods, focusing on the development of …

Block copolymer nanostructured thin films for advanced patterning

MA Chavis, EL Schwartz… - … , Characterization, and Self …, 2011 - Wiley Online Library
In this chapter, we explore the convergence of two fundamentally different patterning
approaches for nanostructured polymer thin films. The well‐established 'top …