The employment of self-assembly of soft materials has been accepted as an inexpensive,
robust, and reliable patterning method. As their self-assembly relies on the delicate …

A requisite for successful nanopatterning is a precise interface control to meet the adequate
surface energies. In block copolymer (BCP) nanopatterning, the interfaces need to be …

Over the past several decades, tremendous efforts have been made to understand the
fundamental physics of block copolymer (BCP) self-assembly in bulk or thin films, and this …

Block copolymer (BCP) nanopatterning has emerged as a versatile nanoscale fabrication
tool for semiconductor devices and other applications, because of its ability to organize well …

Directed self-assembly (DSA) of block copolymers (BCPs), either by selective wetting of
surface chemical prepatterns or by graphoepitaxial alignment with surface topography, has …

A key requirement for practical applications of nanostructured block copolymer (BCP) self-
assembly is the ability to generate complex geometries including different shapes and …

Directed self-assembly (DSA) of block copolymers (BCPs) has garnered much attention due
to its excellent pattern resolution, simple process, and good compatibility with many other …

Block copolymer (BCP) self‐assembly in thin films is an elegant method to generate
nanometric features with tunable geometrical configurations. By combining directed …

Block copolymer (BCP) self-assembly is a promising nanopatterning technique capable of
efficiently forming ultrafine patterns in large areas. One of the fundamental challenges …

We study the guided self-assembly of symmetric/asymmetric diblock copolymer (BCP) films
on heterogeneous substrates with chemically patterned surface by using a coarse-grained …