The idea to write a book about flash lamp annealing (FLA) was born when we collected
material for recent review papers [1–3]. It appeared that on the one hand sufficient …

Flash lamp annealing (FLA) is a non-equilibrium annealing method on the sub-second time
scale which excellently meets the requirements of thin-film processing. FLA has already …

Thermal processing in the subsecond range comprises modern, non-equilibrium annealing
techniques which allow various material modifications at the surface without affecting the …

Thermal processing in the millisecond range provides advanced, non-equilibrium annealing
techniques which allow dedicated material modifications at the surface without affecting the …

Sub-second annealing is one of the key issues to meet the requirements of the 45 nm
technology node according to the ITRS roadmap. Therefore, over the past decade there has …

Flash lamp annealing (FLA) is a modern annealing technique which, starting from
microelectronics, has spread over new application areas like flexible electronics …

Over the last decade millisecond annealing (MSA) has made the transition from a research
tool to a key manufacturing technology for advanced complementary metal-oxide …

Flash lamp annealing (FLA) reduces the thermal budget on the bulk and thus hinders
undesired thermal diffusion. For reliable process control, however, a temperature …

This paper will discuss a new lamp annealing technique called Flash-assist RTP (fRTPTM)
that operates in the large gap in process time between laser thermal processing and …

Ultra-thin glass with thicknesses lower than 200 µm (Fig. 1) is thin enough to be flexible and
provides new applications in display technology and flexible electronics. Compared to …