Graphene-enabled block copolymer lithography transfer to arbitrary substrates

WK Lee, JT Robinson, KE Whitener - Nano Express, 2021 - iopscience.iop.org
We describe a method for phase separating and transferring block copolymer (BCP)
nanoscale patterns to arbitrary substrates for surface-independent nanolithography. The …

[PDF][PDF] Graphene-enabled block copolymer lithography transfer to arbitrary substrates

WK Lee, JT Robinson, KE Whitener Jr - 2021 - keithwhitener.com
We describe a method for phase separating and transferring block copolymer (BCP)
nanoscale patterns to arbitrary substrates for surface-independent nanolithography. The …

Graphene-enabled block copolymer lithography transfer to arbitrary substrates

L Woo-Kyung, JT Robinson, KE Whitener Jr - Nano Express, 2021 - search.proquest.com
We describe a method for phase separating and transferring block copolymer (BCP)
nanoscale patterns to arbitrary substrates for surface-independent nanolithography. The …

Graphene-enabled block copolymer lithography transfer to arbitrary substrates

WK Lee, JT Robinson, KE Whitener Jr - Nano Express, 2021 - ui.adsabs.harvard.edu
We describe a method for phase separating and transferring block copolymer (BCP)
nanoscale patterns to arbitrary substrates for surface-independent nanolithography. The …

Graphene-enabled block copolymer lithography transfer to arbitrary substrates

WK Lee, JT Robinson, KE Whitener Jr - keithwhitener.com
SI Figure S1. XPS analysis of HG/BCP mask and subsequent plasma removal on SiNx
substrate.(a) Photograph of SiNx substrate after relamination of HG/BCP mask.(b) XPS …