Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
A new methodology based on a novel combination of a high-resolution specular x-ray
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
[PDF][PDF] Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
W Wu, WE Wallace, EK Lin, GW Lynnb… - JOURNAL OF …, 2000 - scholar.archive.org
In modern integrated circuitry multilevel interconnection is typically used to create logic
devices from individual transistors. By employing the third dimension, interconnect distances …
devices from individual transistors. By employing the third dimension, interconnect distances …
Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
W Wu, WE Wallace, EK Lin, GW Lynn… - Journal of Applied …, 2000 - ui.adsabs.harvard.edu
A new methodology based on a novel combination of a high-resolution specular x-ray
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
W Wu, WE Wallace, EK Lin, GW Lynn… - Journal of Applied …, 2000 - cir.nii.ac.jp
抄録< jats: p> A new methodology based on a novel combination of a high-resolution
specular x-ray reflectivity and small-angle neutron scattering has been developed to …
specular x-ray reflectivity and small-angle neutron scattering has been developed to …
Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
W Wu, WE Wallace, EK Lin, GW Lynnb… - JOURNAL OF …, 2000 - pubs.aip.org
In modern integrated circuitry multilevel interconnection is typically used to create logic
devices from individual transistors. By employing the third dimension, interconnect distances …
devices from individual transistors. By employing the third dimension, interconnect distances …
[PDF][PDF] Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scattering
W Wu, WE Wallace, EK Lin, GW Lynnb… - JOURNAL OF …, 2000 - tsapps.nist.gov
In modern integrated circuitry multilevel interconnection is typically used to create logic
devices from individual transistors. By employing the third dimension, interconnect distances …
devices from individual transistors. By employing the third dimension, interconnect distances …
Properties of Nanoporous Silica Thin Films Determined by High-Resolution X-Ray Reflectivity and Small-Angle Neutron Scattering
WL Wu, WE Wallace, EK Lin, GW Lynn, CJ Glinka… - 2000 - nist.gov
A new methodology based on a novel combination of a high-resolution specular x-ray
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
Properties of Nanoporous Silica Thin Films Determined by High-Resolution X-Ray Reflectivity and Small-Angle Neutron Scattering
WL Wu, WE Wallace, EK Lin, GW Lynn, CJ Glinka… - 2000 - nist.gov
A new methodology based on a novel combination of a high-resolution specular x-ray
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …
reflectivity and small-angle neutron scattering has been developed to evaluate the structural …