Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu… - Acs Nano - ACS Publications
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …
被引用次数：552 相关文章

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.

MP Stoykovich, H Kang, D KCh, G Liu, CC Liu… - ACS Nano, 2007 - europepmc.org
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

[引用][C] Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu… - ACS Nano, 2007 - cir.nii.ac.jp
Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated
Features and Essential Integrated Circuit Geometries | CiNii Research CiNii 国立情報学研究所 …

Directed self-assembly of block copolymers for nanolithography: Fabrication of isolated features and essential integrated circuit geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu… - 2007 - publications.goettingen-research …
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …
[PDF] academia.edu

[PDF][PDF] Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu… - 2007 - academia.edu
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu… - ACS …, 2007 - pubmed.ncbi.nlm.nih.gov
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu… - ACS …, 2007 - eprints.internano.org
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …
[PDF] academia.edu

[PDF][PDF] Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu, CC Liu… - 2007 - academia.edu
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …

Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries

MP Stoykovich, H Kang, KC Daoulas, G Liu… - ACS …, 2007 - eprints.internano.org
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to
realize sub-100 nm dimensions, thermodynamic control over the size and uniformity and …