Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing

JG Son, JB Chang, KK Berggren, CA Ross - Nano letters, 2011 - ACS Publications
Block copolymer self-assembly generates patterns with periodicity in the∼ 10–100 nm
range and is increasingly recognized as a route to lithographic patterning beyond the …
被引用次数：150 相关文章

Assembly of Sub-10 nm Block Copolymer Patterns with Mixed Morphology and Period using Electron Irradiation and Solvent Annealing

JG Son, JB Chang, KK Berggren, CA Ross - academia.edu
Assembly of Sub-10 nm Block Copolymer Patterns with Mixed Morphology and Period
using Electron Irradiation and Solvent Annealing Page 1 1 Supporting Information …

[引用][C] Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

JG Son, JB Chang, KK Berggren, CA Ross - Nano Letters, 2011 - infona.pl
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using
Electron Irradiation and Solvent Annealing × Close The Infona portal uses cookies, ie strings of …

[引用][C] Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

JG SON, JB CHANG, KK BERGGREN… - Nano letters …, 2011 - pascal-francis.inist.fr
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period
Using Electron Irradiation and Solvent Annealing CNRS Inist Pascal-Francis CNRS Pascal …

[引用][C] Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

JG Son, JB Chang, KK Berggren, CA Ross - Nano Letters, 2011 - ui.adsabs.harvard.edu
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using
Electron Irradiation and Solvent Annealing - NASA/ADS Now on home page ads icon ads …

Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing

JG Son, JB Chang, KK Berggren, CA Ross - 2011 - dspace.mit.edu
Block copolymer self-assembly generates patterns with periodicity in the∼ 10–100 nm
range and is increasingly recognized as a route to lithographic patterning beyond the …

Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing

JG Son, JB Chang, KK Berggren, CA Ross - Nano letters, 2011 - pubmed.ncbi.nlm.nih.gov
Block copolymer self-assembly generates patterns with periodicity in the∼ 10-100 nm range
and is increasingly recognized as a route to lithographic patterning beyond the resolution of …

Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing.

JG Son, JB Chang, KK Berggren, CA Ross - Nano Letters, 2011 - europepmc.org
Block copolymer self-assembly generates patterns with periodicity in the∼ 10-100 nm range
and is increasingly recognized as a route to lithographic patterning beyond the resolution of …

Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing

JG Son, JB Chang, KK Berggren, CA Ross - Nano Letters, 2011 - hero.epa.gov
Block copolymer self-assembly generates patterns with periodicity in the∼ 10-100 nm range
and is increasingly recognized as a route to lithographic patterning beyond the resolution of …

Assembly of Sub-10 nm Block Copolymer Patterns with Mixed Morphology and Period using Electron Irradiation and Solvent Annealing

JG Son, JB Chang, KK Berggren, CA Ross - pstorage-acs-6854636.s3 …
Supporting Information NL203445h Page 1 1 Supporting Information Assembly of Sub-10 nm
Block Copolymer Patterns with Mixed Morphology and Period using Electron Irradiation and …