Preventing kinetic roughening in physical vapor-phase-deposited films
E Vasco, C Polop, JL Sacedon - Physical review letters, 2008 - APS
The growth kinetics of the mostly used physical vapor-phase deposition techniques—
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
[PDF][PDF] Preventing Kinetic Roughening in Physical Vapor-Phase-Deposited Films
E Vasco, C Polop, JL Sacedón - 2008 - staff.ustc.edu.cn
The growth kinetics of the mostly used physical vapor-phase deposition techniques—
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
Preventing kinetic roughening in physical vapor-phase-deposited films.
E Vasco, C Polop, JL Sacedón - Physical Review Letters, 2008 - europepmc.org
The growth kinetics of the mostly used physical vapor-phase deposition techniques-
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition-is …
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition-is …
Preventing Kinetic Roughening in Physical Vapor-Phase-Deposited Films
E Vasco, C Polop, JL Sacedón - Physical Review Letters, 2008 - ui.adsabs.harvard.edu
The growth kinetics of the mostly used physical vapor-phase deposition techniques—
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …
Preventing kinetic roughening in physical vapor-phase-deposited films
E Vasco, C Polop, JL Sacedón - Physical review letters, 2008 - pubmed.ncbi.nlm.nih.gov
The growth kinetics of the mostly used physical vapor-phase deposition techniques-
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition-is …
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition-is …