Characterization of silicon dioxide and phosphosilicate glass deposited films

S Rojas, L Zanotti, A Borghesi, A Sassella… - Journal of Vacuum …, 1993 - pubs.aip.org
Silicate glasses, both undoped and lightly doped with phosphorus, prepared by a low
pressure plasma enhanced chemical vapor deposition (PECVD) system using …
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Characterization of silicon dioxide and phosphosilicate glass deposited films

S Rojas, L Zanotti, A Borghesi, A Sassella… - Journal of Vacuum …, 1993 - pubs.aip.org
Silicate glasses, both undoped and lightly doped with phosphorus, prepared by a low
pressure plasma enhanced chemical vapor deposition (PECVD) system using …

[引用][C] Characterization of silicon dioxide and phosphosilicate glass deposited films

S ROJAS, L ZANOTTI, A BORGHESI… - Journal of vacuum …, 1993 - pascal-francis.inist.fr
Characterization of silicon dioxide and phosphosilicate glass deposited films CNRS Inist
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[引用][C] Characterization of silicon dioxide and phosphosilicate glass deposited films

S Rojas, L Zanotti, A Borghesi… - Journal of Vacuum …, 1993 - ui.adsabs.harvard.edu
Characterization of silicon dioxide and phosphosilicate glass deposited films - NASA/ADS Now
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Characterization of silicon dioxide and phosphosilicate glass deposited films

S Rojas, L Zanotti, A Borghesi, A Sassella… - … VACUUM SCIENCE & …, 1993 - boa.unimib.it
Silicate glasses, both undoped and lightly doped with phosphorus, prepared by a low
pressure plasma enhanced chemical vapor deposition (PECVD) system using …

Characterization of silicon dioxide and phosphosilicate glass deposited films

S Rojas, L Zanotti, A Borghesi, A Sassella… - Journal of Vacuum …, 1993 - cir.nii.ac.jp
抄録< jats: p> Silicate glasses, both undoped and lightly doped with phosphorus, prepared
by a low pressure plasma enhanced chemical vapor deposition (PECVD) system using …

[引用][C] Characterization of silicon dioxide and phosphosilicate glass deposited films

S ROJAS, L ZANOTTI… - Journal of vacuum …, 1993 - American Institute of Physics