We have explored the formation of alumina coatings by electron beam evaporation of bulk alumina ceramic using a forevacuum-pressure plasma-cathode electron beam source at a pressure of 60 mTorr of air. The alumina e-beam target material is evaporated at a rate up to 4.2 g/h, and the coating deposition rate is up to 18 μm/h. The evaporated ceramic is partially ionized by the energetic electron beam, and we have measured the plasma composition as a function of beam power. The deposited alumina coatings were characterized by scanning electron microscopy and energy-dispersive x-ray spectroscopy and found to be uniform and pore-free with a composition that is over 99% aluminum and oxygen, with less than 1% impurities including carbon, silicon and calcium.