With the urgent demands of characterizing the optical properties and thicknesses of nano-
films in some micron-scale trenches usually emerging in integrated circuit manufacturing,
the micro-spot Mueller matrix ellipsometer (M-MME) has attracted increasingly more
attention. While using a lens pair to enable a probing spot with a micron scale in the M-MME,
the additional polarization effects caused by the lens pair usually degrade the measurement
precision of the instrument. Therefore, it is of great significance to calibrate the polarization …