Controlling uniformity of RRAM characteristics through the forming process
A Kalantarian, G Bersuker, DC Gilmer… - 2012 IEEE …, 2012 - ieeexplore.ieee.org
2012 IEEE International Reliability Physics Symposium (IRPS), 2012•ieeexplore.ieee.org
The proposed constant voltage forming (CVF) is shown to increase the resistances of the
low resistance and high resistance states while reducing their variability. By forcing the
forming in all devices to occur at the same predefined voltage, the CVF method eliminates a
major cause of the device-to-device variation associated with the randomness of the forming
voltage values. Moreover, both experiments and simulations show that CVF at lower
voltages suppresses the parasitic overshoot current, resulting in a more controlled and …
low resistance and high resistance states while reducing their variability. By forcing the
forming in all devices to occur at the same predefined voltage, the CVF method eliminates a
major cause of the device-to-device variation associated with the randomness of the forming
voltage values. Moreover, both experiments and simulations show that CVF at lower
voltages suppresses the parasitic overshoot current, resulting in a more controlled and …
The proposed constant voltage forming (CVF) is shown to increase the resistances of the low resistance and high resistance states while reducing their variability. By forcing the forming in all devices to occur at the same predefined voltage, the CVF method eliminates a major cause of the device-to-device variation associated with the randomness of the forming voltage values. Moreover, both experiments and simulations show that CVF at lower voltages suppresses the parasitic overshoot current, resulting in a more controlled and smaller filament cross-section and lower operation currents.
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