[HTML][HTML] Direct laser patterning of ruthenium below the optical diffraction limit
L Cruciani, M Vreugdenhil, S van Vliet, E Abram… - Applied Physics …, 2024 - pubs.aip.org
We describe a method that can be used to produce ruthenium/ruthenium oxide patterns
starting from a ruthenium thin film. The method is based on highly localized oxidation of a
small surface area of a ruthenium film by means of exposure to a pulsed laser under
ambient conditions. Laser exposure is followed by dissolution of the un-exposed ruthenium
in a NaClO solution, which leaves the conductive, partially oxidized ruthenium area on the
substrate. Spatially selective oxidation, material removal, and, by implication, patterning, are …
starting from a ruthenium thin film. The method is based on highly localized oxidation of a
small surface area of a ruthenium film by means of exposure to a pulsed laser under
ambient conditions. Laser exposure is followed by dissolution of the un-exposed ruthenium
in a NaClO solution, which leaves the conductive, partially oxidized ruthenium area on the
substrate. Spatially selective oxidation, material removal, and, by implication, patterning, are …
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