In this article we explore the relationship between the plasma-phase chemistry and deposit
in the plasma deposition of acrylic acid. This is achieved through systematic variation of
some of the plasma deposition variables, termed “processing parameters.” The surface
chemical composition of deposits has been investigated by means of x-ray photoelectron
spectroscopy. Changes in the surface chemical composition with the ratio of plasma power-
to-monomer flow rate, P/φ, substrate position (in the reactor), nature of the substrate, and …