Extended phase diagrams for guiding plasma-enhanced chemical vapor deposition of silicon thin films for photovoltaics applications

AS Ferlauto, RJ Koval, CR Wronski… - Applied physics …, 2002 - pubs.aip.org
Real time spectroscopic ellipsometry has been applied to develop extended phase
diagrams that can guide the deposition of hydrogenated silicon (Si: H) thin films for highest
performance solar cells. Previous such studies have shown that optimization of amorphous
Si: H intrinsic layers by rf plasma-enhanced chemical vapor deposition (PECVD) is achieved
using the maximum possible H 2 dilution of SiH 4 while avoiding a transition to the mixed-
phase (amorphous+ microcrystalline) growth regime. In this study, we propose that …
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