Photolithography is a patterning process that uses light to transfer a pattern from a mask to a photosensitive polymer layer. The resulting pattern can either be etched into the underlying surface or used to define the patterning of a layer deposited onto the masked surface. This is essentially a two-dimensional process that can be repeated numerous times to fabricate various structures and devices. A classic use of these techniques is the fabrication of transistors on a silicon substrate as practiced in the semiconductor industry. Development over a number of years has yielded optimization of processing conditions, equipment, and materials to achieve ever smaller sized features and an increased density of integration. In the effort to fabricate even smaller (submicron to nanometer) features, other fabrication methods have also been developed such as electron beam lithography, focused ion beam lithography, and nanoimprint lithography. This chapter presents an introduction and practical approach to lithography and micromachining techniques in the context of MEMS device fabrication. The topics that are discussed here include: UV lithography, grayscale lithography, e-beam lithography, X-ray lithography, direct-write lithographies and imprint lithographies. A detailed description including highlighted examples of each of these lithographic techniques is presented in this chapter. At the end of the chapter a compilation of hands-on case studies is presented to assist readers in implementing these techniques in their own laboratories and developing custom fabrication capabilities that fulfill their own unique requirements.