Photolabile protecting groups in metal–organic frameworks: preventing interpenetration and masking functional groups
RK Deshpande, GIN Waterhouse… - Chemical …, 2012 - pubs.rsc.org
Chemical Communications, 2012•pubs.rsc.org
Photolabile groups can be incorporated into metal–organic frameworks (MOFs) and then
quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice
interpenetration (catenation) in a cubic MOF derived from zinc (II). Subsequent photolysis
unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.
quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice
interpenetration (catenation) in a cubic MOF derived from zinc (II). Subsequent photolysis
unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.
Photolabile groups can be incorporated into metal–organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.
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