XPS Study in BiFeO3 Surface Modified by Argon Etching
GA Gomez-Iriarte, A Pentón-Madrigal, LAS de Oliveira… - Materials, 2022 - mdpi.com
This paper reports an XPS surface study of pure phase BiFeO 3 thin film produced and later
etched by pure argon ions. Analysis of high-resolution spectra from Fe 2 p, Bi 4 f and 5 d, O
1 s, and the valence band, exhibited mainly Fe 3+ and Bi 3+ components, but also reveal Fe
2+. High-energy argon etching induces the growth of Fe (0) and Bi (0) and an increment of
Fe 2+, as expected. The BiFeO 3 semiconductor character is preserved despite the oxygen
loss, an interesting aspect for the study of the photovoltaic effect through oxygen vacancies …
etched by pure argon ions. Analysis of high-resolution spectra from Fe 2 p, Bi 4 f and 5 d, O
1 s, and the valence band, exhibited mainly Fe 3+ and Bi 3+ components, but also reveal Fe
2+. High-energy argon etching induces the growth of Fe (0) and Bi (0) and an increment of
Fe 2+, as expected. The BiFeO 3 semiconductor character is preserved despite the oxygen
loss, an interesting aspect for the study of the photovoltaic effect through oxygen vacancies …
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