The growth kinetics of the mostly used physical vapor-phase deposition techniques—
molecular beam epitaxy, sputtering, flash evaporation, and pulsed laser deposition—is …

The crossover in kinetic roughening of thin films from a particle-character-dominated regime
to continuous growth behavior has been observed in this work. This has been accomplished …

The application of thin films in electronic devices, relying on multilayer technology, requires
(atomically) smooth film surfaces and interfaces. Understanding of the different mechanisms …

A linearized, stochastic theory of thin film growth and erosion is presented to describe the
evolution of surface roughness in the case of good layer formation far from equilibrium, as is …

The origin of the modern era of thin film technology is closely linked to the development of
vacuum technology. However, the more recent emergence of thin film science as an …

When films are grown by atomic deposition, even on amorphous substrates, they are usually
found to exhibit preferred crystallographic orientation. This can be ascribed to the dominant …

We report on recent progress on the theoretical description of amorphous thin film growth
generated by physical vapor deposition. Specifically, we motivate a minimal model for the …

We demonstrate that shadowing instabilities can dramatically alter the very early stages of
growth of amorphous thin films on nominally smooth surfaces. These observations are made …

Thin film deposition is the most ubiquitous and critical of the processes used to manufacture
high-tech devices such as microprocessors, memories, solar cells, microelectromechanical …

For films deposited by low pressure chemical vapor deposition (LPCVD) the effect of
roughness in the underlying substrate on film microstructure is investigated by computer …