Thickness dependence of optical properties of hydrogenated amorphous silicon films
R Sridhar, R Venkattasubbiah, J Majhi… - Journal of non …, 1990 - Elsevier
A detailed study of the thickness dependence of optical constants of glow discharge
prepared hydrogenated amorphous silicon thin films (a-Si: H) is reported in this paper. The …
prepared hydrogenated amorphous silicon thin films (a-Si: H) is reported in this paper. The …
Effect of deposition parameters on the properties of hydrogenated amorphous silicon films prepared by photochemical vapour deposition
A De, S Ray, AK Barua - Solar energy materials, 1990 - Elsevier
Hydrogenated amorphous silicon (a-Si: H) films were prepared by the process of mercury-
sensitized photochemical vapour deposition. Substrate temperature, hydrogen dilution and …
sensitized photochemical vapour deposition. Substrate temperature, hydrogen dilution and …
Hydrogenation and direct-substitutional doping of evaporated amorphous silicon films
S Iselborn, H Rubel, J Geiger… - Philosophical Magazine …, 1983 - Taylor & Francis
The addition of hydrogen during the evaporation of silicon has been shown to improve the
electrical properties of the resulting a-Si film considerably by saturation of dangling bonds, if …
electrical properties of the resulting a-Si film considerably by saturation of dangling bonds, if …
Amorphous silicon thin-film transistors
T Tsukada - Journal of non-crystalline solids, 1993 - Elsevier
This paper reviews recent R&D activities on hydrogenated amorphous silicon (a-Si) thin-film
transistors (TFTs). One of the most important applications of this device is active matrix liquid …
transistors (TFTs). One of the most important applications of this device is active matrix liquid …
Fabrication of narrow-band-gap hydrogenated amorphous silicon by chemical annealing
W Futako, S Takeoka, CM Fortmann… - Journal of applied …, 1998 - pubs.aip.org
Hydrogenated amorphous silicon films with optical band gaps narrower than 1.7 eV have
been prepared by a chemical annealing process involving the sequential deposition of 10 …
been prepared by a chemical annealing process involving the sequential deposition of 10 …
ANNEALING AND HYDROGENATION BEHAVIOUR OF EVAPORATED AND SPUTTERED HIGH-PURITY AMORPHOUS SILICON FILMS
N Kniffler, WW Müller… - Le Journal de …, 1981 - jphyscol.journaldephysique.org
Amorphous silicon films have been prepared by ultra-clean evaporation and sputter
technique enclosing different amounts of hydrogen into the films. The dark conductivity of …
technique enclosing different amounts of hydrogen into the films. The dark conductivity of …
Sputtered hydrogenated amorphous silicon
TD Moustakas - Journal of Electronic Materials, 1979 - Springer
Hydrogenated a-Si, whose properties can be modified by impurity doping, can be produced
either by decomposition of silane or by reactive sputtering of Si in an argon-hydrogen …
either by decomposition of silane or by reactive sputtering of Si in an argon-hydrogen …
Optical properties of Se or S-doped hydrogenated amorphous silicon thin films with annealing temperature and dopant concentration
We report the effects of the thermal annealing and dopant concentration on the optical
properties of Se or S-doped hydrogenated amorphous silicon thin films. The Se and S …
properties of Se or S-doped hydrogenated amorphous silicon thin films. The Se and S …
[引用][C] Hydrogenated amorphous silicon films deposited by reactive sputtering: The electronic properties, hydrogen bonding and microstructure
M Pinarbasi, N Maley, A Myers, JR Abelson - Thin Solid Films, 1989 - Elsevier
M. PINARBASI, N. MALEY, A. MYERS AND JR ABELSON PROLOGUE Objective: • Kinetics of
Film Growth • Influel~ce or Growth on F Page 1 Thin SolidFilms, 171 (1989) 217 233 217 …
Film Growth • Influel~ce or Growth on F Page 1 Thin SolidFilms, 171 (1989) 217 233 217 …
Relationship between the physicochemical and electronic properties of sputtered hydrogenated amorphous silicon films: The effect of substrate temperature
D Jousse, J Said, JP Stoquert - Thin solid films, 1985 - Elsevier
The variations of the physicochemical and electronic properties of sputtered hydrogenated
amorphous silicon films deposited at substrate temperatures T s between room temperature …
amorphous silicon films deposited at substrate temperatures T s between room temperature …