To realize a stacked multi-layer silicon-based photonic device, a waveguide with a stacked
grating was fabricated by using amorphous Si (a-Si) material, which is suitable for …

Amorphous silicon (a-Si) optical films were deposited on a silicon substrate by ICP-PECVD
at the temperature of 300° C, using argon (Ar) and silane (SiH4) as gas precursors, with the …

We developed a low-polarization-dependent silica-based waveguide, which can be
monolithically integrated with a silicon (Si) waveguide device on a silicon-on-insulator (SOI) …

Amorphous silicon () is an attractive high-refractive-index material for waveguide
applications because of its flexible deposition conditions, which do not rely on the existence …

By way of a brief review of Si photonics technology, we show that significant improvements
in device performance are necessary for practical telecommunications applications. In order …

Amorphous Si waveguides with gradient refractive index cladding structure are proposed
and fabricated using plasma-enhanced chemical vapor deposition method. Compared with …

The fabrication of highly efficient interlayer grating couplers for multilayered a-Si: H
waveguides by introducing two metal mirrors to reflect back the diffracted light was …

A compact arrayed-waveguide grating (AWG) on the silicon-on-insulator material is
designed and fabricated with employment of waveguide-integrated turning mirrors (WITMs) …

Amorphous silicon SOI-AWG device with 59% extra high refractive index difference (Δ) and
the transmission spectrum of AWG's device indicated the insertion loss, crosstalk and side …

The silicon photonic arrayed waveguide grating (AWG) is an important device for achieving
silicon-based photonic integration. We describe the research progress in the AWG based on …