Poly (4-hydroxystyrene)(PHS) has been used in lithography as a backbone polymer and is
also a promising material for extreme-ultraviolet or electron beam lithography. The dynamics …

Abstract Poly (4-hydroxystyrene)(PHS) has been used in current lithography as a backbone
polymer and is also a promising material for EUV and electron beam (EB) lithography. PHS …

Pulse radiolysis of highly concentrated poly (4-hydroxystyrene)(PHS) solutions in
cyclohexanone and p-dioxane was performed both with and without an onium-type …

The charge-resonance (CR) band of dimer radical cations for three isomers of dinaphthyl-
propanes and poly (vinylnaphthalene) s was measured by laser photolysis. 1-(1-Naphthyl)-3 …

The use of ionizing radiation such as extreme ultraviolet (EUV) radiation is expected in next-
generation lithography. Poly (4-hydroxystyrene)(PHS), which has been used in KrF excimer …

The intrapolymer dimer radical cation formed in poly (1-vinylpyrene) and in a novel polymer
of poly (2-vinylpyrene) was studied by nanosecond pulse radiolysis measurements. Both …

The dependence of the kinetic dynamics of the polystyrene dimer radical cation (Ph2+) on
the CCl4 concentration was investigated in a cyclohexane solution by nanosecond pulse …

Poly (methylpropylsilane)(PMPrS) and poly (methylphenylsilane)(PMPS) were investigated
by pulse radiolysis with 2-ns time resolution. PMPrS and PMPS solutions in tetrahydrofuran …

Hydroxyl radicals (generated pulse radiolytically in dilute N2O-saturated aqueous solutions)
react with poly (methacrylic acid) producing two kinds of radicals. The primary radical is …

Hydroxyl radicals, generated by ionizing radiation in N2O saturated aqueous solutions,
abstract H atoms from poly (methacrylic acid) at the methyl and methylene groups, and …