Graphoepitaxy of spherical domain block copolymer films

RA Segalman, H Yokoyama, EJ Kramer - Advanced Materials, 2001 - Wiley Online Library
The long‐range order of spherical block copolymer films is greatly improved if the underlying
surface has been etched to form wells and mesas. Epitaxial growth of polystyrene/poly (2 …

Synthesis of well-defined block copolymers tethered to polysilsesquioxane nanoparticles and their nanoscale morphology on surfaces

J Pyun, K Matyjaszewski, T Kowalewski… - Journal of the …, 2001 - ACS Publications
The synthesis of nanostructured organic/inorganic hybrid materials is an area of increasing
research activity due to the beneficial synergism of properties these materials possess. 1 An …

[引用][C] Fabrication of continuous and segmented polymer/metal oxide nanowires using cylindrical micelles and block comicelles as templates

H Wang, AJ Patil, K Liu, S Petrov, S Mann… - Advanced …, 2009 - Wiley Online Library
The synthesis of 1D nanomaterials, such as nanowires and nanotubes, is of great interest
because of their unique electronic, optical, and optoelectronic properties.[1–6] Owing to its …

Defining the nanostructured morphology of triblock copolymers using resonant soft X-ray scattering

C Wang, DH Lee, A Hexemer, MI Kim, W Zhao… - Nano …, 2011 - ACS Publications
The morphologies of a poly (1, 4-isoprene)-block-polystyrene-block-poly (2-vinyl
pyridine)(IS2VP) copolymer were investigated using resonant soft X-ray scattering (RSoXS) …

Long-range ordering of block copolymer cylinders driven by combining thermal annealing and substrate functionalization

MS She, TY Lo, RM Ho - ACS nano, 2013 - ACS Publications
This work presents a new method for forming well-defined nanostructured thin films from self-
assembled polystyrene-block-poly (l-lactide)(PS-PLLA) on Si wafers with a functionalized …

[PDF][PDF] Fabrication of highly ordered silicon oxide dots and stripes from block copolymer thin films

S Park, B Kim, JY Wang, TP Russell - … -DEERFIELD BEACH THEN …, 2008 - academia.edu
The fabrication of nanopatterned materials has been accomplished by several methods,
including self-organization of polymers, electron-beam lithography, X-ray lithography, optical …

Polarity-switching top coats enable orientation of sub–10-nm block copolymer domains

CM Bates, T Seshimo, MJ Maher, WJ Durand… - Science, 2012 - science.org
Block copolymers (BCPs) must necessarily have high interaction parameters (χ), a
fundamental measure of block incompatibility, to self-assemble into sub–10-nanometer …

Perpendicular orientation control without interfacial treatment of RAFT-synthesized high-χ block copolymer thin films with sub-10 nm features prepared via thermal …

R Nakatani, H Takano, A Chandra… - … applied materials & …, 2017 - ACS Publications
In this study, a series of perpendicular lamellae-forming poly (polyhedral oligomeric
silsesquioxane methacrylate-block-2, 2, 2-trifluoroethyl methacrylate) s (PMAPOSS-b …

A Top Coat with Solvent Annealing Enables Perpendicular Orientation of Sub‐10 nm Microdomains in Si‐Containing Block Copolymer Thin Films

E Kim, W Kim, KH Lee, CA Ross… - Advanced Functional …, 2014 - Wiley Online Library
Achieving sub‐10 nm high‐aspect‐ratio patterns from diblock copolymer self‐assembly
requires both a high interaction parameter (χ, which is determined by the incompatibility …

Asymmetric block copolymers with homopolymers: routes to multiple length scale nanostructures

U Jeong, HC Kim, RL Rodriguez, IY Tsai… - Advanced …, 2002 - Wiley Online Library
Thin polymer films with cylindrical microdomains of controlled size (see Figure for an AFM
image) have been produced from diblock copolymer/homopolymer mixtures. It is …