… The crystallinity of the films was investigated through Raman backscattering spectra. Raman
spectra of the silicon films deposited at different substrate temperatures are shown in Fig. 3 …

… The films grown with a contribution of such ordered silicon clusters were called hydrogenated
nanostructured silicon (ns-Si:H). Indeed, detailed analysis of the structure of silicon films …

… the silicon substrate remained … substrate temperature of 338 K (65 C) to investigate the effect
of the deposition rate on the nucleation density, while the effect of the substrate temperature …

… It is showed in the present work that it is possible to obtain direct growth of nanocrystalline
silicon thin films at substrate temperature as low as room temperature, using the …

… films to silicon substrates was very good and independent on the growth temperature or the
film … This was not the case for the deposition on glass substrates. It was observed that thick …

… deposited films. In this study, we investigated the characterization of silicon oxide (SiO x )
films on flexible PES substrates by PECVD for transparent barrier applications. Silicon oxide …

… of microcrystalline silicon (μc-Si:H) at all temperatures and … and microcrystalline films at lower
substrate temperatures (T sub … of device quality films at low substrate temperatures enables …

… at relatively low temperatures, as far as the use of flexible and low costly substrates is …
quite effective for highly crystallized silicon obtained at temperatures lower than 200 C ⁠, 5 …

… deposition of thin film silicon layers at a very low substrate temperature (around 100 …
temperature opens the way for a variety of unconventional temperature-sensitive polymer substrates…

… Orientation map of the measurement area and grain size variation as a function of area
fraction of titanium films deposited on silicon at substrate temperature at 200 C (a and b), at 400 …